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Solid State Communications

Volumn 150, Issue 37-38, 2010, Pages 1751-1754

Origin of swift heavy ion induced stress in textured ZnO thin films: An in situ X-ray diffraction study

(3) Singh, Fouran a Kulriya, P K a Pivin, J C b

a INTER UNIVERSITY ACCELERATOR CENTRE (India)

b 91405 Orsay Campus (France)

Author keywords

A. ZnO; B. Ion irradiation; C. Structural strain and lattice defects; E. In situ X ray diffraction

Indexed keywords

AFM; ATOMIC FORCE; AVERAGE GRAIN SIZE; B. ION IRRADIATION; DENSITY OF DEFECTS; FLUENCES; IN-SITU; IN-SITU X-RAY DIFFRACTION; INDUCED STRESS; ION IRRADIATION; MICRO-RAMAN; PULSED LASER; STRUCTURAL STRAIN; SWIFT HEAVY IONS; ZNO; ZNO THIN FILM;

ATOMIC SPECTROSCOPY; DEFECTS; FOURIER TRANSFORMS; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; HEAVY IONS; HOLOGRAPHIC INTERFEROMETRY; IRRADIATION; METALLIC FILMS; OPTICAL FILMS; PULSED LASER DEPOSITION; PULSED LASERS; THIN FILMS; X RAY DIFFRACTION; X RAYS; ZINC OXIDE;

DIFFRACTION;

EID: 77957377806 PISSN: 00381098 EISSN: None Source Type: Journal
DOI: 10.1016/j.ssc.2010.07.026 Document Type: Article

Times cited : (39)

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