SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology B

Volumn 28, Issue 4, 2010, Pages 806-808

Novel planarizing scheme for patterned media

(10) Poh, Wei Choong Allen a Tan, Hang Khume a Ong, Lay Ting b Hui, Hui Kim b Wong, Seng Kai a Aung, Kyaw Oo a Tan, Eileen a Sbiaa, Rachid a Kay, Yew Seng a Piramanayagam, S N a

a DATA STORAGE INSTITUTE (Singapore)

b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; GLASS TRANSITION; TOPOGRAPHY;

LOW GLASS TRANSITION TEMPERATURES; LOW VISCOSITY; METHACRYLATE POLYMERS; PATTERNED MEDIUM; PLANARIZATION; PLANARIZING; POLY(METHYL METHACRYLATE); POLY-METHYL METHACRYLATES; RECORDING MEDIA; SI(100) SURFACE;

ESTERS;

EID: 77957221761 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3455497 Document Type: Conference Paper

Times cited : (1)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.