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Volumn 97, Issue 12, 2010, Pages

The nature of high voltage initiation of an electrical arc in a vacuum

Author keywords

[No Author keywords available]

Indexed keywords

ARC IGNITION; ARC VOLTAGE; CATHODE PLASMAS; CATHODE POTENTIAL; ELECTRICAL ARC; GAP VOLTAGE; HIGH VOLTAGE; PHYSICAL MODEL; SPOT IGNITION; TRANSIENT ENERGY; VOLTAGE OSCILLATION;

EID: 77957153067     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3491446     Document Type: Article
Times cited : (12)

References (15)
  • 1
    • 0004029498 scopus 로고
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    • Handbook of Vacuum Arc Science and Technology, edited by, R. L. Boxman, P. J. Martin, and, D. M. Sanders, (Noyes, Park Ridge, New Jersey, 1995).
    • (1995) Handbook of Vacuum Arc Science and Technology
  • 2
    • 84938443356 scopus 로고
    • IEEPAD 0018-9219,. 10.1109/PROC.1966.4570
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    • (1966) Proc. IEEE , vol.54 , pp. 23
    • Lafferty, J.M.1
  • 5
    • 36849100211 scopus 로고
    • JAPIAU 0021-8979,. 10.1063/1.1657960
    • W. D. Davis and H. C. Miller, J. Appl. Phys. JAPIAU 0021-8979 40, 2212 (1969). 10.1063/1.1657960
    • (1969) J. Appl. Phys. , vol.40 , pp. 2212
    • Davis, W.D.1    Miller, H.C.2
  • 8
    • 0017456316 scopus 로고
    • IETDAI 0018-9383,. 10.1109/T-ED.1977.18690
    • R. L. Boxman, IEEE Trans. Electron Devices IETDAI 0018-9383 24, 122 (1977). 10.1109/T-ED.1977.18690
    • (1977) IEEE Trans. Electron Devices , vol.24 , pp. 122
    • Boxman, R.L.1
  • 9
    • 0035485741 scopus 로고    scopus 로고
    • State of the theory of vacuum arcs
    • DOI 10.1109/27.964451, PII S0093381301092700, Vacuum Discharge Plasmas
    • I. I. Beilis, IEEE Trans. Plasma Sci. ITPSBD 0093-3813 29, 657 (2001). 10.1109/27.964451 (Pubitemid 33137805)
    • (2001) IEEE Transactions on Plasma Science , vol.29 , pp. 657-670
    • Beilis, I.I.1
  • 10
    • 0002153228 scopus 로고
    • in, edited by R. L. Boxman, P. J. Martin, and D. M. Sanders (Noyes, Park Ridge, New Jersey)
    • I. I. Beilis, in Handbook of Vacuum Arc Science and Technology, edited by, R. L. Boxman, P. J. Martin, and, D. M. Sanders, (Noyes, Park Ridge, New Jersey, 1995), pp. 208-256.
    • (1995) Handbook of Vacuum Arc Science and Technology , pp. 208-256
    • Beilis, I.I.1
  • 11
    • 0042023535 scopus 로고    scopus 로고
    • CPPHEP 0863-1042,. 10.1002/ctp200310018
    • I. I. Beilis, Contrib. Plasma Phys. CPPHEP 0863-1042 43, 224 (2003). 10.1002/ctpp.200310018
    • (2003) Contrib. Plasma Phys. , vol.43 , pp. 224
    • Beilis, I.I.1
  • 13
    • 0015648512 scopus 로고
    • JAPIAU 0021-8979,. 10.1063/1.1662710
    • C. W. Kimblin, J. Appl. Phys. JAPIAU 0021-8979 44, 3074 (1973). 10.1063/1.1662710
    • (1973) J. Appl. Phys. , vol.44 , pp. 3074
    • Kimblin, C.W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.