CVD Cu2O and CuO Nanosystems Characterized by XPS

Surface Science Spectra

Volumn 14, Issue 1-4, 2007, Pages 41-51

  Barreca, Davide ^a   Gasparotto, Alberto ^a   Tondello, Eugenio ^a  

^a UNIVERSITY OF PADOVA   (Italy)

Author keywords

Cu2O; CuO; CVD; Nanosystems; X ray photoelectron spectroscopy

Indexed keywords

AUGER PARAMETERS; CHEMICAL NATURE; CU2O; CUO; HIGH SURFACE-TO-VOLUME RATIO; SECOND GENERATION; TETRAMETHYLETHYLENEDIAMINE; X-RAY PHOTOELECTRONS;

AUGER ELECTRON SPECTROSCOPY; CHEMICAL ANALYSIS; CHEMICAL VAPOR DEPOSITION; IODINE; PHOTOELECTRONS; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOSYSTEMS;

EID: 77956936510     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/11.20080701     Document Type: Article

References (26)

1. Zhang, Y.C. Tang, J.Y. Wang, G.L. Zhang, M. Hu, X.Y., J. Cryst. Growth 294, 278 (2006)., JCRGAE, 0022-0248, 10.1016/j.jcrysgro.2006.06.038
2. Yang, M. Zhu, J.-J., J. Cryst. Growth 256, 134 (2003)., JCRGAE, 0022-0248, 10.1016/S0022-0248(03)01298-3
3. Wang, X. Xi, G. Xiong, S. Liu, Y. Xi, B. Yu, Y. Qian, Y., Cryst. Growth Des. 7, 930 (2007)., CGDEFU, 1528-7483, 10.1021/cg060798j
4. Armelao, L. Barreca, D. Bertapelle, M. Bottaro, G. Sada, C. Tondello, E., Thin Solid Films 442, 48 (2003)., THSFAP, 0040-6090, 10.1016/S0040-6090(03)00940-4
5. Chauan, D. Satsangi, V.R. Dass, S. Shrivastav, R., Bull. Mater. Sci. 29, 709 (2006)., BUMSDW, 0250-4707
6. Morales, J. Sànchez, L. Martìn, F. Ramos-Barrado, J.R. Sànchez, M., Thin Solid Films 474, 133 (2005)., THSFAP, 0040-6090, 10.1016/j.tsf.2004.08.071
7. Morales, J. Sànchez, L. Bijani, S. Martínez, L. Gabás, M. Ramos-Barrado, J.R., Electrochem. Solid State Lett. 8, A159 (2005)., 10.1149/1.1854126
8. Bijani, S. Gabás, M. Martínez, L. Ramos-Barrado, J.R. Morales, J. Sànchez, L., Thin Solid Films 515, 5505 (2007)., THSFAP, 0040-6090, 10.1016/j.tsf.2007.01.016
9. Liu, Y. Liao, L. Li, J. Pan, C., J. Phys. Chem. C 111, 5050 (2007)., JPCCCK, 1932-7447, 10.1021/jp069043d
10. Yao, W.-T. Yu, S.-H. Zhou, Y. Jiang, J. Wu, Q.-S. Zhang, L. Jiang, J., J. Phys. Chem B 109, 14011 (2005)., 10.1021/jp0517605
11. Kaur, M. Muthe, P. Despande, S.K. Choudhury, S. Singh, J.B. Verma, N. Gupta, S.K. Yakhami, J.V., J. Cryst. Growth 289, 670 (2006)., JCRGAE, 0022-0248, 10.1016/j.jcrysgro.2005.11.111
12. Chen, U.S. Chueh, Y.L. Lai, S.H. Chou, L.J. Shih, H.S., J. Vac. Sci. Technol. B 24, 139 (2006)., JVTBD9, 1071-1023, 10.1116/1.2151215
13. Armelao, L. Barreca, D. Bottaro, G. Mattei, G. Sada, C. Tondello, E., Chem. Mater. 17, 1450 (2005)., CMATEX, 0897-4756, 10.1021/cm048245o
14. Armelao, L. Barreca, D. Bertapelle, M. Bottaro, G. Sada, C. Tondello, E., Mater. Res. Soc. Symp. Proc. 737, F8.27.1 (2003)., MRSPDH, 0272-9172
15. Morales, J. Sànchez, L. Martìn, F. Ramos-Barrado, J.R. Sànchez, M., Electrochim. Acta 49, 4589 (2004)., ELCAAV, 0013-4686, 10.1016/j.electacta.2004.05.012
16. Pattern No. 5-667, JCPDS (2000).
17. Delgado, S. Muñoz, A. Medina, M.E. Pastor, C.J., Inorg. Chim. Acta 359, 109 (2006)., ICHAA3, 0020-1693, 10.1016/j.ica.2005.10.018
18. Barreca, D. Gasparotto, A. Maragno, C. Tondello, E. Sada, C., Chem. Vap. Deposition 10, 229 (2004)., CVDEFX, 0948-1907, 10.1002/cvde.200306292
19. Barreca, D. Gasparotto, A. Maragno, C. Tondello, E. Bontempi, E. Depero, L.E. Sada, C., Chem. Vap. Deposition 11, 426 (2005)., CVDEFX, 0948-1907, 10.1002/cvde.200506412
20. Pattern No. 45-937, JCPDS (2000).
21. Vasquez, R.P., Surf. Sci. Spectra 5, 257 (1998)., 10.1116/1.1247881
22. http://srdata.nist.gov/xps
23. Moulder, J.F. Stickle, W.F. Bomben, K.D., Handbook of X-ray Photoelectron Spectroscopy (Perkin Elmer Corporation, Eden Prairie, MN, 1992).
24. Vasquez, R.P., Surf. Sci. Spectra 5, 262 (1998)., SSSPEN, 1055-5269, 10.1116/1.1247882
25. Briggs, D. Seah, M.P., Practical Surface Analysis: Auger and X-ray Photoelectron Spectroscopy (Wiley, New York, 1990).
26. Shirley, D.A., Phys. Rev. B 5, 4709 (1972)., PRBMDO, 0163-1829, 10.1103/PhysRevB.5.4709