Electrochromic performance of NiVxOy thin films deposited onto flexible PET/ITO substrates by reactive plasma sputtering for flexible electrochromic devices

Thin Solid Films

Volumn 518, Issue 24, 2010, Pages 7416-7420

  Lin, Y S ^a   Chen, P W ^a   Lin, D J ^a  

^a FENG CHIA UNIVERSITY   (Taiwan)

Author keywords

Cyclic voltammetry; Electrochromism; Flexible substrate; Nickel oxide; Sputter; Vanadium oxide

Indexed keywords

DEINTERCALATION; ELECTROCHROMIC PERFORMANCE; ELECTROCHROMIC PROPERTIES; FLEXIBLE ELECTROCHROMIC DEVICE; FLEXIBLE SUBSTRATE; ION INTERCALATION; LOW DRIVING VOLTAGE; OPTICAL DENSITIES; OXIDE SUBSTRATES; OXYGEN GAS; PROPYLENE CARBONATE ELECTROLYTE; RADIO FREQUENCY POWER; REACTIVE PLASMAS; ROOM TEMPERATURE; SPUTTER; VANADIUM OXIDE; VANADIUM OXIDE THIN FILMS;

ARGON; BIOELECTRIC PHENOMENA; ELECTROCHROMIC DEVICES; ELECTROCHROMISM; NICKEL; NICKEL OXIDE; OXIDE FILMS; OXYGEN; POLYETHYLENE TEREPHTHALATES; PROPYLENE; SUBSTRATES; THIN FILMS; TIN; TIN OXIDES; TITANIUM COMPOUNDS; VANADIUM; VANADIUM ALLOYS; VANADIUM COMPOUNDS;

CYCLIC VOLTAMMETRY;

EID: 77956871718     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.05.004     Document Type: Conference Paper

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