-
1
-
-
1642475230
-
Ferroelectricity at the Nanoscale: Local Polarization in Oxide Thin Films and Heterostructures
-
DOI 10.1126/science.1092508
-
C. H. Ahn, K. M. Rabe, and J. M. Triscone, Science SCIEAS 0036-8075 303, 488 (2004). 10.1126/science.1092508 (Pubitemid 38120840)
-
(2004)
Science
, vol.303
, Issue.5657
, pp. 488-491
-
-
Ahn, C.H.1
Rabe, K.M.2
Triscone, J.-M.3
-
2
-
-
35348846979
-
-
SCIEAS 0036-8075. 10.1126/science.246.4936.1400
-
J. F. Scott and C. Paz de Araujo, Science SCIEAS 0036-8075 246, 1400 (1989). 10.1126/science.246.4936.1400
-
(1989)
Science
, vol.246
, pp. 1400
-
-
Scott, J.F.1
Paz De Araujo, C.2
-
3
-
-
0032109136
-
-
PHTOAD 0031-9228 (). 10.1063/1.882324
-
O. Auciello, J. F. Scott, and R. Ramesh, Phys. Today PHTOAD 0031-9228 51 (7), 22 (1998). 10.1063/1.882324
-
(1998)
Phys. Today
, vol.51
, Issue.7
, pp. 22
-
-
Auciello, O.1
Scott, J.F.2
Ramesh, R.3
-
4
-
-
71749103255
-
-
JAPIAU 0021-8979. 10.1063/1.3261841
-
J. Wu and J. Wang, J. Appl. Phys. JAPIAU 0021-8979 106, 104111 (2009). 10.1063/1.3261841
-
(2009)
J. Appl. Phys.
, vol.106
, pp. 104111
-
-
Wu, J.1
Wang, J.2
-
5
-
-
0037436499
-
3 multiferroic thin film heterostructures
-
DOI 10.1126/science.1080615
-
J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A. Spaldin, K. M. Rabe, M. Wuttig, and R. Ramesh, Science SCIEAS 0036-8075 299, 1719 (2003). 10.1126/science.1080615 (Pubitemid 36337195)
-
(2003)
Science
, vol.299
, Issue.5613
, pp. 1719-1722
-
-
Wang, J.1
Neaton, J.B.2
Zheng, H.3
Nagarajan, V.4
Ogale, S.B.5
Liu, B.6
Viehland, D.7
Vaithyanathan, V.8
Schlom, D.G.9
Waghmare, U.V.10
Spaldin, N.A.11
Rabe, K.M.12
Wuttig, M.13
Ramesh, R.14
-
6
-
-
33745160011
-
3
-
DOI 10.1002/adma.200502622
-
J. Dho, X. Qi, H. Kim, J. L. MacManus-Driscoll, and M. G. Blamire, Adv. Mater. ADVMEW 0935-9648 18, 1445 (2006). 10.1002/adma.200502622 (Pubitemid 43893459)
-
(2006)
Advanced Materials
, vol.18
, Issue.11
, pp. 1445-1448
-
-
Dho, J.1
Qi, X.2
Kim, H.3
MacManus-Driscoll, J.L.4
Blamire, M.G.5
-
7
-
-
34548698689
-
Reduced leakage current in la and Ni codoped BiFe O3 thin films
-
DOI 10.1063/1.2784968
-
S. K. Singh, K. Maruyama, and H. Ishiwara, Appl. Phys. Lett. APPLAB 0003-6951 91, 112913 (2007). 10.1063/1.2784968 (Pubitemid 47416016)
-
(2007)
Applied Physics Letters
, vol.91
, Issue.11
, pp. 112913
-
-
Singh, S.K.1
Maruyama, K.2
Ishiwara, H.3
-
8
-
-
60749107172
-
-
NMAACR 1476-1122. 10.1038/nmat2373
-
J. Seidel, L. W. Martin, Q. He, Q. Zhan, Y.-H. Chu, A. Rother, M. E. Hawkridge, P. Maksymovych, P. Yu, M. Gajek, N. Balke, S. V. Kalinin, S. Gemming, F. Wang, G. Catalan, J. F. Scott, N. A. Spaldin, J. Orenstein, and R. Ramesh, Nature Mater. NMAACR 1476-1122 8, 229 (2009). 10.1038/nmat2373
-
(2009)
Nature Mater.
, vol.8
, pp. 229
-
-
Seidel, J.1
Martin, L.W.2
He, Q.3
Zhan, Q.4
Chu, Y.-H.5
Rother, A.6
Hawkridge, M.E.7
Maksymovych, P.8
Yu, P.9
Gajek, M.10
Balke, N.11
Kalinin, S.V.12
Gemming, S.13
Wang, F.14
Catalan, G.15
Scott, J.F.16
Spaldin, N.A.17
Orenstein, J.18
Ramesh, R.19
-
9
-
-
63749084322
-
-
JAPIAU 0021-8979. 10.1063/1.3055412
-
S. Hong, J. A. Klug, M. Park, A. Imre, M. J. Bedzyk, K. No, A. Petford-Long, and O. Auciello, J. Appl. Phys. JAPIAU 0021-8979 105, 061619 (2009). 10.1063/1.3055412
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 061619
-
-
Hong, S.1
Klug, J.A.2
Park, M.3
Imre, A.4
Bedzyk, M.J.5
No, K.6
Petford-Long, A.7
Auciello, O.8
-
10
-
-
33745025555
-
-
MIMIF7 1431-9276. 10.1017/S1431927606060156
-
S. V. Kalinin, B. J. Rodriguez, S. Jesse, J. Shin, A. P. Baddorf, P. Gupta, H. Jain, D. B. Williams, and A. Gruverman, Microsc. Microanal. MIMIF7 1431-9276 12, 206 (2006). 10.1017/S1431927606060156
-
(2006)
Microsc. Microanal.
, vol.12
, pp. 206
-
-
Kalinin, S.V.1
Rodriguez, B.J.2
Jesse, S.3
Shin, J.4
Baddorf, A.P.5
Gupta, P.6
Jain, H.7
Williams, D.B.8
Gruverman, A.9
-
11
-
-
77951837590
-
-
APPLAB 0003-6951. 10.1063/1.3327831
-
R. Nath, S. Hong, J. A. Klug, A. Imre, M. J. Bedzyk, R. S. Katiyar, and O. Auciello, Appl. Phys. Lett. APPLAB 0003-6951 96, 163101 (2010). 10.1063/1.3327831
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 163101
-
-
Nath, R.1
Hong, S.2
Klug, J.A.3
Imre, A.4
Bedzyk, M.J.5
Katiyar, R.S.6
Auciello, O.7
-
12
-
-
77956813985
-
-
See supplementary material at E-APPLAB-97-071036 for detailed experimental conditions of PFM measurements.
-
See supplementary material at http://dx.doi.org/10.1063/1.3487933 E-APPLAB-97-071036 for detailed experimental conditions of PFM measurements.
-
-
-
-
13
-
-
33645159834
-
-
APPLAB 0003-6951. 10.1063/1.2184892
-
M. Murakami, S. Fujino, S.-H. Lim, L. G. Salamanca-Riba, M. Wuttig, I. Takeuchia, B. Varughese, H. Sugaya, T. Hasegawa, and S. E. Lofland, Appl. Phys. Lett. APPLAB 0003-6951 88, 112505 (2006). 10.1063/1.2184892
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 112505
-
-
Murakami, M.1
Fujino, S.2
Lim, S.-H.3
Salamanca-Riba, L.G.4
Wuttig, M.5
Takeuchia, I.6
Varughese, B.7
Sugaya, H.8
Hasegawa, T.9
Lofland, S.E.10
-
14
-
-
29144449940
-
3 films
-
DOI 10.1063/1.2149180, 252902
-
F. Zavaliche, P. Shafer, R. Ramesh, M. P. Cruz, R. R. Das, D. M. Kim, and C. B. Eom, Appl. Phys. Lett. APPLAB 0003-6951 87, 252902 (2005). 10.1063/1.2149180 (Pubitemid 41816158)
-
(2005)
Applied Physics Letters
, vol.87
, Issue.25
, pp. 1-3
-
-
Zavaliche, F.1
Shafer, P.2
Ramesh, R.3
Cruz, M.P.4
Das, R.R.5
Kim, D.M.6
Eom, C.B.7
-
15
-
-
34548491826
-
Controlling magnetism with multiferroics
-
DOI 10.1016/S1369-7021(07)70241-9, PII S1369702107702419
-
Y. Chu, L. W. Martin, M. B. Holcomb, and R. Ramesh, Mater. Today MTOUAN 1369-7021 10, 16 (2007). 10.1016/S1369-7021(07)70241-9 (Pubitemid 47380444)
-
(2007)
Materials Today
, vol.10
, Issue.10
, pp. 16-23
-
-
Chu, Y.-H.1
Martin, L.W.2
Holcomb, M.B.3
Ramesh, R.4
-
16
-
-
0000262148
-
-
PLRBAQ 0556-2805. 10.1103/PhysRevB.50.698
-
W. L. Zhong, Y. G. Wang, P. L. Zhang, and B. D. Qu, Phys. Rev. B PLRBAQ 0556-2805 50, 698 (1994). 10.1103/PhysRevB.50.698
-
(1994)
Phys. Rev. B
, vol.50
, pp. 698
-
-
Zhong, W.L.1
Wang, Y.G.2
Zhang, P.L.3
Qu, B.D.4
-
17
-
-
56349137192
-
-
JCOMEL 0953-8984. 10.1088/0953-8984/20/34/342201
-
A. Gruverman, D. Wu, H.-J. Fan, I. Vrejoiu, M. Alexe, R. J. Harrison, and J. F. Scott, J. Phys.: Condens. Matter JCOMEL 0953-8984 20, 342201 (2008). 10.1088/0953-8984/20/34/342201
-
(2008)
J. Phys.: Condens. Matter
, vol.20
, pp. 342201
-
-
Gruverman, A.1
Wu, D.2
Fan, H.-J.3
Vrejoiu, I.4
Alexe, M.5
Harrison, R.J.6
Scott, J.F.7
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