Surface modification of indium tin oxide films by amino ion implantation for the attachment of multi-wall carbon nanotubes

Applied Surface Science

Volumn 257, Issue 3, 2010, Pages 752-755

  Jiao, Jiao ^a   Liu, Chenyao ^a   Chen, Qunxia ^a   Li, Shuoqi ^a   Hu, Jingbo ^a   Li, Qilong ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

Indium tin oxide; Ion implantation; Multi wall carbon nanotubes; Uric acid

Indexed keywords

CARBON FILMS; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL ELECTRODES; INDIUM COMPOUNDS; ION IMPLANTATION; IONS; ITO GLASS; ORGANIC ACIDS; SCANNING ELECTRON MICROSCOPY; SURFACE TREATMENT; TIN OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY; YARN;

ELECTROCATALYTIC ACTIVITY; ELECTROCHEMICAL ANALYSIS; ELECTRODE MATERIAL; FOURIER TRANSFORM INFRARED SPECTRA; INDIUM TIN OXIDE; INDIUM TIN OXIDE FILMS; SCANNING ELECTRON MICROSCOPY IMAGE; URIC ACIDS;

MULTIWALLED CARBON NANOTUBES (MWCN);

EID: 77956615737     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.07.059     Document Type: Article

References (30)

1. T.A. Ivandini, R. Sato, Y. Makide, A. Fujishima, and Y. Einaga Anal. Chem. 78 2006 6291
2. Z.J. Sun, J.B. Hu, Y.Q. Lu, and Q.L. Li Analyst 128 2003 930
3. Y.N. Mao, J.B. Hu, Q.L. Li, and P. Xue Analyst 125 2000 2299
4. D.M. Gao, Y. Sun, Q.Y. Zhao, J.B. Hu, and Q.L. Li Microchim. Acta 160 2008 241
5. S.Q. Li, J. Xia, C.Y. Liu, W. Cao, J.B. Hu, and Q.L. Li J. Electroanal. Chem. 633 2009 273
6. T.A. Ivandini, R. Sato, Y. Makide, A. Fujishima, and Y. Einaga Diamond Relat. Mater. 13 2004 2003
7. T.A. Ivandini, R. Sato, Y. Makide, A. Fujishima, and Y. Einaga Diamond Relat. Mater. 14 2005 2133
8. S. Iijima Nature 354 1991 56
9. M. Penza, G. Cassano, R. Rossi, A. Rizzo, M.A. Signore, M. Alvisi, N. Lisi, E. Serra, and R. Giorgi Appl. Phys. Lett. 90 2007 103101
10. M.S. Dresselhaus Nature 391 1998 19
11. X.L. Liang, L.M. Peng, Q. Chen, R.C. Che, Y. Xia, Z.Q. Xue, and Q.D. Wu Phys. Rev. B: Condens. Matter 68 2003 073403
12. L.V.C. Cantalini, L. Lozzi, I. Armentano, J.M. Kenny, and S. Santucci Sens. Actuator B: Chem. 93 2003 333
13. I. Takesue, J. Haruyama, N. Kobayashi, S. Chiashi, S. Maruyama, T. Sugai, and H. Shinohara Phys. Rev. Lett. 96 2006 057001
14. D. Tasis, N. Tagmatarchis, A. Bianco, and M. Prato Chem. Rev. 106 2006 1105
15. J. Wang Electroanalysis 17 2005 7
16. N. Koratkar, B.Q. Wei, and P.M. Ajayan Adv. Mater. 14 2002 997
17. K. Kostarelos, L. Lacerda, C.D. Partidos, M. Prato, and A. Blanco J. Drug Deliv. Sci. Technol. 15 2005 41
18. Y.H. Lin, F. Lu, Y. Tu, and Z.F. Ren Nano Lett. 4 2004 191
19. R.R. Moore, C.E. Banks, and R.G. Compton Anal. Chem. 76 2004 2677
20. D. Du, M.H. Wang, J. Cai, Y.H. Qin, and A.D. Zhang Sens. Actuator B: Chem. 143 2010 524
21. M.G. Zhang, A. Smith, and W. Gorski Anal. Chem. 76 2004 5045
22. A. Yu, Z. Liang, J. Cho, and F. Caruso Nano Lett. 3 2003 1203
23. C.D. Wick, L.X. Dang, and P. Jungwirth J. Chem. Phys. 125 2006 024706
24. K. Nakano, T. Yoshitake, Y. Yamashita, and E.F. Bowden Langmuir 23 2007 6270
25. Z.H. Wang, Y.M. Wang, and G. Luo Electroanalysis 15 2003 1129
26. Z.H. Wang, Q.L. Liang, Y.M. Wang, and G.A. Luo J. Electroanal. Chem. 540 2003 129
27. M. Musameh, N.S. Lawrence, and J. Wang Electrochem. Commun. 7 2005 14
28. X.Q. Lin, J.B. He, and Z.G. Zha Sens. Actuator B: Chem. 119 2006 608
29. N.S. Lawrence, R.P. Deo, and J. Wang Anal. Chim. Acta 517 2004 131
30. R.P. Deo, N.S. Lawrence, and J. Wang Analyst 129 2004 1076