Comparing process flow of monolithic CMOS-MEMS intergration on SOI wafers with monolithic BiMOS-MEMS integration on silicon wafer

Midwest Symposium on Circuits and Systems

Volumn , Issue , 2010, Pages 1189-1192

  Solanki, Ashok ^a   Prasad, Kanti ^a   Nunan, Kieran ^b   Oreilly, Rob ^b  

^a University of Massachusetts   (United States)

^b ANALOG DEVICES INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANALOG DEVICES; CMOS-MEMS; CONTROL ELECTRONICS; ELECTRONICS SYSTEM; FABRICATION PROCESS; INTEGRATED CIRCUIT INDUSTRIES; INTEGRATED MEMS; MECHANICAL SENSORS; MECHANICAL TRANSDUCERS; MEMSDEVICES; MICROELECTROMECHANICAL SYSTEMS ACCELEROMETERS; MONOLITHIC INTEGRATION; PROCESS FLOWS; SILICON SUBSTRATES; SILICON-ON-INSULATOR SUBSTRATES; SINGLE CRYSTAL SILICON; SOI WAFERS; SURFACE MICROMACHINING TECHNOLOGY;

COMPOSITE MICROMECHANICS; ELECTRONICS INDUSTRY; FABRICATION; MEMS; MICROELECTROMECHANICAL DEVICES; MONOLITHIC INTEGRATED CIRCUITS; POLYSILICON; SEMICONDUCTING SILICON COMPOUNDS; SINGLE CRYSTALS; SUBSTRATES; SURFACE MICROMACHINING;

SILICON WAFERS;

EID: 77956567570     PISSN: 15483746     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MWSCAS.2010.5548876     Document Type: Conference Paper

References (3)

1. T. A. Core, R. T. Howe, "Method for fabricating Microstructures, " U.S. Patent No. 5, 314, 572, May. 1994.
2. M. Villarroya, E. Figueras, J. Montserrat, J. Verd, J. Teva, G. Abadal, F. P. Murano, J. Essteve, and N. Barniol "A platform for monolithic CMOS-MEMS integration on SOI wafer," J. Micromech. Microeng. 16 (2006) 2203-2210.
3. Lange D, Hagleitner C, Hierleman A, Brand O and Baltes H "Complementary metal oxide semiconductor cantilever arrays on a single chip: mass-sensitive detection of volatile organic compounds." Analytical Chemistry 74 (2002) 3084-95.