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Volumn 45, Issue 20, 2010, Pages 5704-5710
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Photoluminescence and photoreactivity affected by oxygen defects in crystal-oriented rutile thin film fabricated by molecular precursor method
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Author keywords
[No Author keywords available]
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Indexed keywords
CRACK FREE;
DEFECT SITES;
EMISSION BANDS;
FIELD EMISSION SCANNING ELECTRON MICROSCOPY;
HEAT TREATING;
LOW ENERGY REGIONS;
MOLECULAR PRECURSOR METHOD;
NO EMISSIONS;
OXYGEN DEFECT;
PHOTOLUMINESCENCE EMISSION;
POST ANNEALING TREATMENT;
PRECURSOR FILMS;
QUARTZ GLASS SUBSTRATES;
TI COMPLEXES;
CRYSTAL ORIENTATION;
DEFECTS;
FIELD EMISSION;
FIELD EMISSION MICROSCOPES;
MOLECULAR OXYGEN;
OXIDE MINERALS;
PHOTOLUMINESCENCE;
QUARTZ;
SCANNING ELECTRON MICROSCOPY;
SUBSTRATES;
THIN FILMS;
TITANIUM COMPOUNDS;
VAPOR DEPOSITION;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
ANNEALING;
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EID: 77956486253
PISSN: 00222461
EISSN: 15734803
Source Type: Journal
DOI: 10.1007/s10853-010-4640-z Document Type: Article |
Times cited : (6)
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References (21)
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