Molecular mechanisms of photoinduced oxygen evolution, PL emission, and surface roughening at atomically smooth (110) and (100) n-TiO2 (rutile) surfaces in aqueous acidic solutions

Journal of the American Chemical Society

Volumn 127, Issue 37, 2005, Pages 12975-12983

  Nakamura, Ryuhei ^a   Okamura, Tomoaki ^a   Ohashi, Naomichi ^a   Imanishi, Akihito ^a   Nakato, Yoshihiro ^a,b  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPIC (AFM) INSPECTION; MOLECULAR MECHANISMS; OXYGEN PHOTOEVOLUTION; TITANIUM DIOXIDE SURFACES;

ATOMIC FORCE MICROSCOPY; CONFORMATIONS; MOLECULAR DYNAMICS; OXYGEN; SURFACE ROUGHNESS;

TITANIUM DIOXIDE;

METAL OXIDE; OXYGEN; TITANIUM DIOXIDE; WATER;

AQUEOUS SOLUTION; ARTICLE; ATOMIC FORCE MICROSCOPY; CLEANING; LIGHT; MEASUREMENT; MOLECULAR MECHANICS; PHOTOCATALYSIS; SURFACE PROPERTY;

CRYSTALLOGRAPHY, X-RAY; LUMINESCENT MEASUREMENTS; MICROSCOPY, ATOMIC FORCE; MODELS, MOLECULAR; OXYGEN; PHOTOCHEMISTRY; SENSITIVITY AND SPECIFICITY; SOLUTIONS; SURFACE PROPERTIES; TIME FACTORS; TITANIUM; WATER;

EID: 25144449114     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja053252e     Document Type: Article

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