Surface-enhanced Raman scattering substrate of silver nanoparticles depositing on AAO template fabricated by magnetron sputtering

Vacuum

Volumn 84, Issue 12, 2010, Pages 1415-1418

  Nuntawong, Noppadon ^a   Horprathum, Mati ^a   Eiamchai, Pitak ^a   Wong Ek, Krongkamol ^b   Patthanasettakul, Viyapol ^a   Chindaudom, Pongpan ^a  

^a NATIONAL ELECTRONICS AND COMPUTER TECHNOLOGY CENTER   (Thailand)

^b CHULALONGKORN UNIVERSITY   (Thailand)

Author keywords

AAO; Magnetron sputtering; Raman scattering; Sensor; SERS; Silver nanoparticles

Indexed keywords

ALUMINUM COATINGS; ANODIC OXIDATION; AROMATIC COMPOUNDS; FABRICATION; MAGNETRON SPUTTERING; METAL NANOPARTICLES; NANOPARTICLES; NANOSTRUCTURES; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY; SENSORS; SILVER; SPUTTERING; SURFACE SCATTERING; TRANSMISSION ELECTRON MICROSCOPY;

ANODIC ALUMINUM OXIDE; DETECTION LIMITS; FABRICATION PROCESS; MAGNETRON SPUTTERING METHOD; SERS; SERS SUBSTRATE; SILVER NANOPARTICLES; SURFACE ENHANCED RAMAN SCATTERING (SERS);

SUBSTRATES;

EID: 77956426496     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.12.020     Document Type: Conference Paper

References (21)

1. Chaney SB, Shanmukh S, Dluhy RA, Zhao Y-P. Appl Phys Lett 2005;87:031908.
2. Fang J, Yi Y, Din B, Song X. A 2008;92:131115.
3. Yan F, Vo-Dinh T. Sens Actuators B 2007;121:61.
4. Liu GL, Lee LP. Appl Phys Lett 2005;87:074101.
5. Alexander TA, Le DM. Appl Opt 2007;46:3878.
6. Suzuki M, Maekita W, Wada Y, Nakajima K, Kimura K, Fukuoka T, et al. Appl Phys Lett 2006;88:203121.
7. Ruan C, Eres G, Wang W, Zhang Z, Gu B. Langmuir 2007;23:5757.
8. Gu GH, Kim J, Kim L, Suh JS. J Phys Chem C 2007;111:7906.
9. Lombardi I, Cavallotti PL, Carraro C, Maboudian R. Sens Actuators B 2007;125:353.
10. Driskell JD, Shanmukh S, Liu Y, Chaney SB, Tang X-J, Zhao Y-P, et al. J Phys Chem C 2008;112:895.
11. Nie S, Emory SR. Science 1997;275:1102.
12. Wang Y, Kneipp H, Perelman LT, Itzkan I, Dasari RR, Feld MS, et al. Phys Rev Lett 1997;78:1667.
13. Liao PF, Bergman JG, Chemla DS, Wokaun A, Melngailis J, Hawryluk AM, et al. Chem Phys Lett 1981;82:355.
14. Zhang X, Yonzon CR, Young MA, Stuart DA, Van Duyne RP. IEEE Proc Nano-biotechnol 2005;152.
15. Walsh RJ, Chumanov G. Appl Spectrosc 2001;55:1695.
16. Xiao GN, Man SQ. Chem Phys Lett 2007;447:305.
17. Laurent G, Fé lidj N, Aubard J, Lévi G. Phys Rev B 2005;71:045430.
18. Jiang H, Chen WX, Xu ZD. Chin J Chem Phys 1998;11:82.
19. Félidj N, Aubard J, Lévi G, Krenn JR, Salerno M, Schiner G, et al. Phys Rev B 2005;65:075419.
20. Naujok RR, Duevel RV, Corn RM. Langmuir 1993;9:1771.
21. Hulchineon K, Heater R, Albery J, Hillman AR. J Chem Soc Faraday Trans 1984;1(80):2053.