SCOPUS 정보 검색 플랫폼

Volumn 64, Issue 22, 2010, Pages 2450-2453

Yttria-stabilized zirconia thin film electrolyte produced by RF sputtering for solid oxide fuel cell applications

(8) Smeacetto, Federico a Salvo, Milena a Ajitdoss, Lakshmi Chandru a Perero, Sergio a Moskalewicz, Tomasz b Boldrini, Stefano c Doubova, Lioudmila c Ferraris, Monica a

a POLITECNICO DI TORINO (Italy)

b AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY (Poland)

c CNR Consiglio Nazionale delle Ricerche (Italy)

Author keywords

Ceramics; Microstructure; Nanomaterials; Thin films

Indexed keywords

CERAMICS; CRACK FREE; FUSED SILICA SUBSTRATES; IN-PLANE CONDUCTIVITY; NANO-CRYSTALLINE STRUCTURES; NANO-MATERIALS; POST DEPOSITION ANNEALING; RF-SPUTTERING; SOLID OXIDE; TEMPERATURE RANGE; YSZ FILMS; YTTRIA-STABILIZED ZIRCONIA THIN FILMS;

ACTIVATION ENERGY; CERAMIC MATERIALS; DEPOSITION; FUSED SILICA; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; SILICA; SOLID ELECTROLYTES; SOLID OXIDE FUEL CELLS (SOFC); THIN FILMS; VAPOR DEPOSITION; YTTRIUM ALLOYS; ZIRCONIA; ZIRCONIUM;

YTTRIA STABILIZED ZIRCONIA;

EID: 77956241524 PISSN: 0167577X EISSN: None Source Type: Journal
DOI: 10.1016/j.matlet.2010.08.016 Document Type: Article

Times cited : (38)

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