Evaluation of Co and perovskite Cr-blocking thin films on SOFC interconnects

Solid State Ionics

Volumn 181, Issue 27-28, 2010, Pages 1294-1302

  Lacey, Robert ^a   Pramanick, Abhijit ^a   Lee, Jae Chun ^b   Jung, Jae Il ^a   Jiang, Bo ^a   Edwards, Doreen D ^a   Naum, Robert ^c   Misture, Scott T ^a  

^a Alfred University   (United States)

^b Myong Ji University   (South Korea)

^c Applied Coatings Inc   (United States)

Author keywords

Chromium blocking; Interconnect; SOFC

Indexed keywords

BLISTER FORMATION; CO FILMS; FILM-SUBSTRATE INTERFACES; INTER-DIFFUSION; INTERCONNECT; INTERCONNECT MATERIALS; PEROVSKITE FILMS; PHYSICAL VAPOR DEPOSITIONS (PVD); SOFC; SPINEL LAYERS; TARGET MATERIALS; THERMAL STABILITY; THERMAL TREATMENT; THIN-FILM COATINGS; UNIFORM FILMS; XPS DEPTH PROFILING;

ADHESION; CHROMATE COATINGS; CHROMIUM; DEPTH PROFILING; DIFFUSION COATINGS; EPITAXIAL GROWTH; PEROVSKITE; PHYSICAL VAPOR DEPOSITION; SOLID OXIDE FUEL CELLS (SOFC); SURFACE PHENOMENA; THIN FILMS;

COBALT;

EID: 77956182906     PISSN: 01672738     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssi.2010.07.007     Document Type: Article

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