Flexible resistive switching memory device based on graphene oxide

IEEE Electron Device Letters

Volumn 31, Issue 9, 2010, Pages 1005-1007

  Hong, Seul Ki ^a   Kim, Ji Eun ^a   Kim, Sang Ouk ^a   Choi, Sung Yool ^b   Cho, Byung Jin ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Flexible memory; graphene oxide; resistive switching memory

Indexed keywords

DATA RETENTION; ELECTRODE MATERIAL; FLEXIBLE MEMORY; FLEXIBLE SUBSTRATE; GRAPHENE OXIDES; MEMORY DEVICE; RESISTANCE RATIO; RESISTIVE SWITCHING; RESISTIVE SWITCHING MEMORIES; SWITCHING PERFORMANCE; SWITCHING PROPERTIES;

ELECTROCHEMICAL ELECTRODES; FLEXIBLE ELECTRONICS; GRAPHENE; SWITCHING SYSTEMS;

SWITCHING;

EID: 77956172739     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2010.2053695     Document Type: Article

References (6)

1. T. Mikolajick, M. Salinga, M. Kund, and T. Kever, "Nonvolatile memory concepts based on resistive switching in inorganic materials," Adv. Eng. Mater., vol.11, no.4, pp. 235-240, Apr. 2009.
2. M. Cölle, M. Büchel, and D. M. De Leeuw, "Switching and filamentary conduction in non-volatile organic memories," Organ. Electron., vol.7, no.5, pp. 305-312, Oct. 2006.
3. C. L. He, F. Zhuge, X. F. Zhou, M. Li, G. C. Zhou, Y. W. Liu, J. Z. Wang, B. Chen, W. J. Su, Z. P. Liu, Y. H. Wu, P. Cui, and R.-W. Li, "Nonvolatile resistive switching in graphene oxide thin films," Appl. Phys. Lett., vol.95, no.23, p. 232 101, Dec. 2009.
4. J. T. Robinson, M. Zalalutdinov, J. W. Baldwin, E. S. Snow, Z. Wei, P. Sheehan, and B. H. Houston, "Wafer-scale reduced graphene oxide films for nanomechanical devices," Nano Lett., vol.8, no.10, pp. 3441-3445, Sep. 2008.
5. T. I'shida, H. Kobayashi, and Y. Nakato, "Structures and properties of electron-beam-evaporated indium tin oxide films as studied by X-ray pho-toelectron spectroscopy and work-function measurements," J. Appl. Phys., vol.73, no.9, pp. 4344-4350, May 1993.
6. K. Sugiyama, H. Ishii, Y. Ouchi, and K. Seki, "Dependence of indium-tin-oxide work function on surface cleaning method as studied by ultraviolet and X-ray photoemission spectroscopies," J. Appl. Phys., vol.87, no.1, pp. 295-298, Jan. 2000.