Atomic oxygen generation by in-situ plasma and post-plasma in dielectric barrier discharges for surface treatment

Thin Solid Films

Volumn 518, Issue 22, 2010, Pages 6578-6582

  Kang, Woo Seok ^a   Kim, Hyun Su ^a   Hong, Sang Hee ^a  

^a Seoul National University   (South Korea)

Author keywords

Atomic oxygen; Dielectric barrier discharge; In situ plasma; NO titration; Numerical simulation; Optical actinometry; Post plasma

Indexed keywords

ATOMIC OXYGEN; DIELECTRIC BARRIER DISCHARGES; IN-SITU; NO TITRATION; NUMERICAL SIMULATION; OPTICAL ACTINOMETRY; POST-PLASMA;

ANGLE MEASUREMENT; ATOMS; COMPUTER SIMULATION; CONTACT ANGLE; DIELECTRIC DEVICES; EFFLUENTS; ELECTRIC REACTORS; FLOW CONTROL; OXYGEN; PLASMAS; SURFACE DISCHARGES; SURFACE TREATMENT; TITRATION;

PLASMA DIAGNOSTICS;

EID: 77956064366     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.04.045     Document Type: Conference Paper

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