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Volumn 43, Issue 9, 2010, Pages 1099-1105

Nanomeasuring and nanopositioning engineering

Author keywords

Nanometrology; Nanoprobes; NPM Machines; Plan mirror interferometers

Indexed keywords

ABBE OFFSET; AFM; DOUBLE-BEAM; FOCUS SENSORS; GERMANY; GUIDE SYSTEM; HIGH-PRECISION; LONG RANGE; MEASUREMENT RESULTS; MEASURING RANGES; MECHANICAL PRECISION; NANO-POSITIONING; NANO-STRUCTURING; NANOMEASURING; NANOMETROLOGY; NANOPOSITIONING AND NANOMEASURING MACHINES; NANOTOOLS; NEW MATERIAL; NPM-MACHINES; PHYSIKALISCH-TECHNISCHE BUNDESANSTALT; PLAN MIRROR INTERFEROMETERS; PROBE SYSTEMS; PROCESS MEASUREMENTS; RESEARCH INSTITUTES; SENSOR TECHNOLOGIES; SINGLE BEAM; SIX DEGREES OF FREEDOM; TACTILE PROBES; WAFER INSPECTION; WHITE LIGHT; WORK PIECES;

EID: 77956060896     PISSN: 02632241     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.measurement.2010.04.008     Document Type: Article
Times cited : (56)

References (7)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.