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Volumn 43, Issue 9, 2010, Pages 1099-1105
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Nanomeasuring and nanopositioning engineering
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Author keywords
Nanometrology; Nanoprobes; NPM Machines; Plan mirror interferometers
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Indexed keywords
ABBE OFFSET;
AFM;
DOUBLE-BEAM;
FOCUS SENSORS;
GERMANY;
GUIDE SYSTEM;
HIGH-PRECISION;
LONG RANGE;
MEASUREMENT RESULTS;
MEASURING RANGES;
MECHANICAL PRECISION;
NANO-POSITIONING;
NANO-STRUCTURING;
NANOMEASURING;
NANOMETROLOGY;
NANOPOSITIONING AND NANOMEASURING MACHINES;
NANOTOOLS;
NEW MATERIAL;
NPM-MACHINES;
PHYSIKALISCH-TECHNISCHE BUNDESANSTALT;
PLAN MIRROR INTERFEROMETERS;
PROBE SYSTEMS;
PROCESS MEASUREMENTS;
RESEARCH INSTITUTES;
SENSOR TECHNOLOGIES;
SINGLE BEAM;
SIX DEGREES OF FREEDOM;
TACTILE PROBES;
WAFER INSPECTION;
WHITE LIGHT;
WORK PIECES;
GENETIC ENGINEERING;
INTERFEROMETERS;
METAL FOIL;
MIRRORS;
NANOPROBES;
PROBES;
SCANNING PROBE MICROSCOPY;
SENSORS;
SYSTEMATIC ERRORS;
UNCERTAINTY ANALYSIS;
PRECISION ENGINEERING;
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EID: 77956060896
PISSN: 02632241
EISSN: None
Source Type: Journal
DOI: 10.1016/j.measurement.2010.04.008 Document Type: Article |
Times cited : (56)
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References (7)
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