Comparison of dry etching of PMMA and polycarbonate in diffusion pump-based O2 capacitively coupled plasma and inductively coupled plasma

Thin Solid Films

Volumn 518, Issue 22, 2010, Pages 6465-6468

  Park, J H ^a   Lee, S H ^a   Choi, K H ^a   Noh, H S ^a   Lee, J W ^a   Pearton, S J ^b  

^a Inje University   (South Korea)

^b J Crayton Pruitt Family Department of Biomedical Engineering   (United States)

Author keywords

CCP; Diffusion pump; Dry etching; ICP; O2 plasma; PMMA; Polycarbonate

Indexed keywords

CCP; DIFFUSION PUMP; ICP; O2 PLASMA; PMMA;

DIFFUSION; ELECTROMAGNETIC INDUCTION; INDUCTIVELY COUPLED PLASMA; PHOTORESISTS; PLASMA ETCHING; PLASTIC PRODUCTS; SURFACE ROUGHNESS; VACUUM PUMPS;

DRY ETCHING;

EID: 77956056808     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.02.053     Document Type: Conference Paper

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