-
1
-
-
2342486652
-
-
NATUAS 0028-0836. 10.1038/nature02498
-
S. R. Forrest, Nature (London) NATUAS 0028-0836 428, 911 (2004). 10.1038/nature02498
-
(2004)
Nature (London)
, vol.428
, pp. 911
-
-
Forrest, S.R.1
-
2
-
-
41549130406
-
-
OERLAU 1566-1199. 10.1016/j.orgel.2008.01.007
-
M. Ramuz, L. Bürgi, C. Winnewisser, and P. Seitz, Org. Electron. OERLAU 1566-1199 9, 369 (2008). 10.1016/j.orgel.2008.01.007
-
(2008)
Org. Electron.
, vol.9
, pp. 369
-
-
Ramuz, M.1
Bürgi, L.2
Winnewisser, C.3
Seitz, P.4
-
3
-
-
70349524665
-
-
SCIEAS 0036-8075. 10.1126/science.1176706
-
X. Gong, M. Tong, Y. Xia, W. Cai, J. S. Moon, Y. Cao, G. Yu, C. -L. Shieh, B. Nilsson, and A. J. Heeger, Science SCIEAS 0036-8075 325, 1665 (2009). 10.1126/science.1176706
-
(2009)
Science
, vol.325
, pp. 1665
-
-
Gong, X.1
Tong, M.2
Xia, Y.3
Cai, W.4
Moon, J.S.5
Cao, Y.6
Yu, G.7
Shieh, C.-L.8
Nilsson, B.9
Heeger, A.J.10
-
4
-
-
73649138908
-
-
APPLAB 0003-6951. 10.1063/1.3279133
-
I. H. Campbell and B. K. Crone, Appl. Phys. Lett. APPLAB 0003-6951 95, 263302 (2009). 10.1063/1.3279133
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 263302
-
-
Campbell, I.H.1
Crone, B.K.2
-
5
-
-
57349172969
-
-
APPLAB 0003-6951. 10.1063/1.3043431
-
J. Gao and F. A. Hegmann, Appl. Phys. Lett. APPLAB 0003-6951 93, 223306 (2008). 10.1063/1.3043431
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 223306
-
-
Gao, J.1
Hegmann, F.A.2
-
6
-
-
33645697326
-
-
AFMDC6 1616-301X. 10.1002/adfm.200500578
-
J. Reynaert, V. I. Arkhipov, P. Heremans, and J. Poortmans, Adv. Funct. Mater. AFMDC6 1616-301X 16, 784 (2006). 10.1002/adfm.200500578
-
(2006)
Adv. Funct. Mater.
, vol.16
, pp. 784
-
-
Reynaert, J.1
Arkhipov, V.I.2
Heremans, P.3
Poortmans, J.4
-
7
-
-
51349138248
-
-
NNAABX 1748-3387. 10.1038/nnano.2008.206
-
H. -Y. Chen, L. K. F. G. Yang, H. G. Monbouquette, and Y. Yang, Nat. Nanotechnol. NNAABX 1748-3387 3, 543 (2008). 10.1038/nnano.2008.206
-
(2008)
Nat. Nanotechnol.
, vol.3
, pp. 543
-
-
Chen, H.-Y.1
Yang, L.K.F.G.2
Monbouquette, H.G.3
Yang, Y.4
-
8
-
-
0032179732
-
-
THSFAP 0040-6090. 10.1016/S0040-6090(98)00900-6
-
M. Hiramoto, K. Nakayama, I. Sato, H. Kumaoka, and M. Yokoyama, Thin Solid Films THSFAP 0040-6090 331, 71 (1998). 10.1016/S0040-6090(98)00900-6
-
(1998)
Thin Solid Films
, vol.331
, pp. 71
-
-
Hiramoto, M.1
Nakayama, K.2
Sato, I.3
Kumaoka, H.4
Yokoyama, M.5
-
9
-
-
79956053074
-
-
APPLAB 0003-6951. 10.1063/1.1500771
-
G. Matsunobu, Y. Oishi, M. Yokoyama, and M. Hiramoto, Appl. Phys. Lett. APPLAB 0003-6951 81, 1321 (2002). 10.1063/1.1500771
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 1321
-
-
Matsunobu, G.1
Oishi, Y.2
Yokoyama, M.3
Hiramoto, M.4
-
10
-
-
44849092759
-
-
APPLAB 0003-6951. 10.1063/1.2937403
-
Y. Zheng, S. -H. Eom, N. Chopra, J. Lee, F. So, and J. Xue, Appl. Phys. Lett. APPLAB 0003-6951 92, 223301 (2008). 10.1063/1.2937403
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 223301
-
-
Zheng, Y.1
Eom, S.-H.2
Chopra, N.3
Lee, J.4
So, F.5
Xue, J.6
-
11
-
-
67349162951
-
-
OERLAU 1566-1199. 10.1016/j.orgel.2009.03.002
-
S. -H. Eom, Y. Zheng, E. Wrzesniewski, J. Lee, N. Chopra, F. So, and J. Xue, Org. Electron. OERLAU 1566-1199 10, 686 (2009). 10.1016/j.orgel.2009.03.002
-
(2009)
Org. Electron.
, vol.10
, pp. 686
-
-
Eom, S.-H.1
Zheng, Y.2
Wrzesniewski, E.3
Lee, J.4
Chopra, N.5
So, F.6
Xue, J.7
-
12
-
-
1542276737
-
-
JAPIAU 0021-8979. 10.1063/1.1640453
-
J. Xue and S. R. Forrest, J. Appl. Phys. JAPIAU 0021-8979 95, 1859 (2004). 10.1063/1.1640453
-
(2004)
J. Appl. Phys.
, vol.95
, pp. 1859
-
-
Xue, J.1
Forrest, S.R.2
-
13
-
-
1542366623
-
-
JAPIAU 0021-8979. 10.1063/1.1640454
-
J. Xue and S. R. Forrest, J. Appl. Phys. JAPIAU 0021-8979 95, 1869 (2004). 10.1063/1.1640454
-
(2004)
J. Appl. Phys.
, vol.95
, pp. 1869
-
-
Xue, J.1
Forrest, S.R.2
-
15
-
-
2942689945
-
-
APPLAB 0003-6951. 10.1063/1.1755833
-
S. Uchida, J. Xue, B. P. Rand, and S. R. Forrest, Appl. Phys. Lett. APPLAB 0003-6951 84, 4218 (2004). 10.1063/1.1755833
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 4218
-
-
Uchida, S.1
Xue, J.2
Rand, B.P.3
Forrest, S.R.4
-
16
-
-
0031232824
-
-
CHREAY 0009-2665. 10.1021/cr941014o
-
S. R. Forrest, Chem. Rev. (Washington, D.C.) CHREAY 0009-2665 97, 1793 (1997). 10.1021/cr941014o
-
(1997)
Chem. Rev. (Washington, D.C.)
, vol.97
, pp. 1793
-
-
Forrest, S.R.1
-
17
-
-
33947701671
-
-
PLRBAQ 0556-2805. 10.1103/PhysRevB.75.115327
-
B. P. Rand, D. P. Burk, and S. R. Forrest, Phys. Rev. B PLRBAQ 0556-2805 75, 115327 (2007). 10.1103/PhysRevB.75.115327
-
(2007)
Phys. Rev. B
, vol.75
, pp. 115327
-
-
Rand, B.P.1
Burk, D.P.2
Forrest, S.R.3
-
18
-
-
0242386370
-
-
JPBPEM 0887-6266. 10.1002/polb.10642
-
A. Kahn, N. Koch, and W. Gao, J. Polym. Sci., Part B: Polym. Phys. JPBPEM 0887-6266 41, 2529 (2003). 10.1002/polb.10642
-
(2003)
J. Polym. Sci., Part B: Polym. Phys.
, vol.41
, pp. 2529
-
-
Kahn, A.1
Koch, N.2
Gao, W.3
-
20
-
-
29744433798
-
-
JAPIAU 0021-8979. 10.1063/1.2142072
-
B. P. Rand, J. Xue, S. Uchida, and S. R. Forrest, J. Appl. Phys. JAPIAU 0021-8979 98, 124902 (2005). 10.1063/1.2142072
-
(2005)
J. Appl. Phys.
, vol.98
, pp. 124902
-
-
Rand, B.P.1
Xue, J.2
Uchida, S.3
Forrest, S.R.4
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