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Volumn 1222, Issue , 2010, Pages 167-172

Aluminum thermo-compression bonding characterization

Author keywords

[No Author keywords available]

Indexed keywords

BOND INTERFACE; BOND PROCESS; BOND QUALITY; BOND STRENGTH; BONDED WAFERS; BONDING TEMPERATURES; BONDING TIME; FORMING GAS; FOUR-POINT BENDING TEST; INTERFACIAL ADHESION ENERGY; MICRO ELECTRO MECHANICAL SYSTEM; SCANNING ACOUSTIC MICROSCOPY; THERMO COMPRESSION BONDING; THERMO-COMPRESSION; WAFER LEVEL;

EID: 77955944970     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (4)

References (4)
  • 2
    • 77955974464 scopus 로고    scopus 로고
    • A1 to A1 wafer bonding for MEMS encapsulation and 3-D Interconnect
    • Tucson, AZ, USA, January 13-17
    • C.H. Yun, J.R. Martin, E.B. Tarvin, and J.T. Winbigler, "A1 to A1 wafer bonding for MEMS encapsulation and 3-D Interconnect", IEEE MEMS 2008, Tucson, AZ, USA, January 13-17, 2008.
    • (2008) IEEE MEMS 2008
    • Yun, C.H.1    Martin, J.R.2    Tarvin, E.B.3    Winbigler, J.T.4
  • 3
    • 0032606530 scopus 로고    scopus 로고
    • Dynamics of oxidation of aluminum nanoclusters using variable charge molecular-dynamics, simulations on parallel computers
    • T. Campbell, R. K. Kalia, A. Nakano, and P. Vashishta, "Dynamics of Oxidation of Aluminum Nanoclusters using Variable Charge Molecular-Dynamics, Simulations on Parallel Computers", Physical review letters Volume 82, Number 24.
    • Physical Review Letters , vol.82 , Issue.24
    • Campbell, T.1    Kalia, R.K.2    Nakano, A.3    Vashishta, P.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.