Chemical degradation mechanism of model compound, CF3(CF 2)3O(CF2)2OCF2SO 3H, of PFSA polymer by attack of hydroxyl radical in PEMFCs

Journal of the Electrochemical Society

Volumn 157, Issue 9, 2010, Pages

  Ishimoto, Takayoshi ^a   Nagumo, Ryo ^a   Ogura, Teppei ^a   Ishihara, Takashi ^b   Kim, Boyeong ^c   Miyamoto, Akira ^c,d   Koyama, Michihisa ^a  

^a KYUSHU UNIVERSITY   (Japan)

^b KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

^d TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BOND STRENGTH; C-O BOND CLEAVAGE; CHEMICAL DEGRADATION; CHEMICAL GROUP; DEGRADATION MECHANISM; DEGRADATION REACTION; DENSITY FUNCTIONAL THEORY CALCULATIONS; ETHER GROUP; HIGH HUMIDITY; HYDROXYL RADICALS; LOW HUMIDITY CONDITIONS; MODEL COMPOUND; OH RADICAL; PERFLUOROSULFONIC ACID; SIDE CHAINS; STERIC HINDRANCES; SULFONIC ACID GROUPS; TWO DIRECTIONS;

ACIDS; BOND STRENGTH (CHEMICAL); DENSITY FUNCTIONAL THEORY; DURABILITY; ETHERS; FREE RADICALS; FUEL CELLS; ORGANIC COMPOUNDS;

DEGRADATION;

EID: 77955818983     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3462970     Document Type: Article

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