Structural characterization of sputtered indium oxide films deposited at room temperature

Thin Solid Films

Volumn 518, Issue 16, 2010, Pages 4508-4511

  Hotovy, I ^a   Pezoldt, J ^b   Kadlecikova, M ^a   Kups, T ^b   Spiess, L ^b   Breza, J ^a   Sakalauskas, E ^b   Goldhahn, R ^b   Rehacek, V ^a  

^a SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^b ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Cubic indium oxide; Optical properties; Reactive sputter deposition; Rhombohedral indium oxide; Structure

Indexed keywords

ABSORPTION EDGES; CRYSTALLINITIES; GRAIN SIZE; INDIUM OXIDE; INDIUM OXIDE FILMS; NANO-CRYSTALLINE STRUCTURES; OXYGEN CONCENTRATIONS; REACTIVE MAGNETRON SPUTTERING; REACTIVE SPUTTER DEPOSITION; REDUCING ATMOSPHERE; RHOMBOHEDRAL INDIUM OXIDE; RHOMBOHEDRAL PHASE; ROOM TEMPERATURE; STRUCTURAL CHARACTERIZATION; STRUCTURAL EVOLUTION; STRUCTURE;

ANNEALING; ARGON; INDIUM; OPTICAL FILMS; OPTICAL PROPERTIES; OXYGEN; PHASE TRANSITIONS;

OXIDE FILMS;

EID: 77955642191     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.12.018     Document Type: Conference Paper

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