Characterization of crystallized TiO2 film by post plasma treatment

Ceramic Transactions

Volumn 217, Issue , 2010, Pages 149-160

  Watanabe, Toshiya ^a   Yokota, Yukinobu ^a   Yoshida, Naoya ^a   Shibayama, Yuko ^a   Ohsaki, Hisashi ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b NONE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS THIN FILMS; ANATASE FILMS; FLAT SURFACES; FLATTER SURFACES; LOWER AVERAGE; NANO-METER SCALE; OXYGEN PARTIAL PRESSURE; PLASMA TREATMENT; POST-PLASMA; SLIDING ANGLE; TEM OBSERVATIONS; TIO; WATER CONTACT ANGLE; WATER DROPLETS;

CERAMIC MATERIALS; CLARIFICATION; CONTACT ANGLE; GLASS; HYDROPHOBICITY; LITHIUM COMPOUNDS; METALLIC GLASS; OXYGEN; PLASMA APPLICATIONS; PLASMAS; SURFACE ROUGHNESS; THIN FILMS; TITANIUM DIOXIDE;

AMORPHOUS FILMS;

EID: 77955589132     PISSN: 10421122     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (10)

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