Ultrathin topological insulator Bi2Se3 nanoribbons exfoliated by atomic force microscopy

Nano Letters

Volumn 10, Issue 8, 2010, Pages 3118-3122

  Hong, Seung Sae ^a   Kundhikanjana, Worasom ^a   Cha, Judy J ^b   Lai, Keji ^a   Kong, Desheng ^b   Meister, Stefan ^b   Kelly, Michael A ^b   Shen, Zhi Xun ^a   Cui, Yi ^b  

^a STANFORD UNIVERSITY   (United States)

^b Stanford University   (United States)

Author keywords

atomic force microscopy; bismuth selenide; mechanical exfoliation; nanoribbon; Topological insulator

Indexed keywords

AFM; ATOMIC FORCE MICROSCOPES; BISMUTH SELENIDE; BOTTOM SURFACES; EDGE STATE; MECHANICAL EXFOLIATION; METALLIC BEHAVIORS; MICROWAVE IMPEDANCE; NANORIBBON; NANORIBBONS; PRACTICAL IMPORTANCE; QUANTUM SPIN HALLS; SHARP CONTRAST; TEMPERATURE DEPENDENCE; TRANSPORT MEASUREMENTS; ULTRA-THIN; VAN DER WAALS INTERACTIONS;

ATOMIC FORCE MICROSCOPY; BISMUTH; ELECTRIC RESISTANCE; TOPOLOGY; VAN DER WAALS FORCES;

ATOMS;

EID: 77955583809     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl101884h     Document Type: Article

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