Subsurface defect of the SiOx film imaged by atomic force acoustic microscopy

Optics and Lasers in Engineering

Volumn 48, Issue 11, 2010, Pages 1108-1112

  Cunfu, He ^a   Gaimei, Zhang ^a   Bin, Wu ^a   Zaiqi, Wu ^a  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Acoustic amplitude image; Atomic force acoustic microscopy; Local elasticity; SiOx film; Subsurface defect

Indexed keywords

ATOMIC FORCE ACOUSTIC MICROSCOPY; EXCITATION FREQUENCY; GLASS SLIDES; LOCAL ELASTICITY; NANO SCALE; SUBSURFACE DEFECT; ULTRASONIC FREQUENCY;

ACOUSTIC MICROSCOPES; ACOUSTIC VARIABLES MEASUREMENT; AMPLITUDE MODULATION; DEFECTS; ELASTICITY; MATERIALS PROPERTIES; MECHANICAL PROPERTIES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON OXIDES; SILICON WAFERS; VAPOR DEPOSITION;

ATOMS;

EID: 77955549554     PISSN: 01438166     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlaseng.2009.12.014     Document Type: Article

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