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Current Applied Physics

Volumn 10, Issue SUPPL. 3, 2010, Pages

Metal-free CNTs grown on glass substrate by microwave PECVD

(6) Seo, Jae Keun a Jung, Hosung b Lee, Jae Hyeoung c Deok, Shin Yong d Young, Ju Jin d Choi, Won Seok a

a Hanbat National University (South Korea)

b Korea Railroad Research Institute (South Korea)

c Kunsan National University (South Korea)

d Wonkwang University (South Korea)

Author keywords

Amorphous carbon; Carbon nanotube (CNT); Catalyst; Microwave plasma enhanced chemical vapor deposition (MPECVD); RF magnetron sputtering

Indexed keywords

A-CARBON; AMORPHOUS CARBON (A-C); CATALYST LAYERS; CORNING GLASS; DIFFERENT THICKNESS; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FREE CARBON; GLASS SUBSTRATES; GROWTH TIME; GROWTH TRENDS; MICROWAVE PECVD; MICROWAVE PLASMA; MICROWAVE PLASMA ENHANCED CHEMICAL-VAPOR DEPOSITION (MPECVD); MULTI-WALLED; RF MAGNETRON SPUTTERING; RF MAGNETRON SPUTTERING METHOD; ROOM TEMPERATURE;

CARBON NANOTUBES; CATALYSTS; ENAMELS; ENERGY DISPERSIVE SPECTROSCOPY; GLASS; MAGNETRON SPUTTERING; METHANE; MICROWAVES; PLASMA DEPOSITION; PLASMAS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; VAPOR DEPOSITION;

AMORPHOUS CARBON;

EID: 77955514851 PISSN: 15671739 EISSN: None Source Type: Journal
DOI: 10.1016/j.cap.2010.02.022 Document Type: Conference Paper

Times cited : (12)

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