Characterization of the surface layer due to oxygen for the hydrogen related C-SiC films

Vacuum

Volumn 85, Issue 1, 2010, Pages 26-29

  Zou, Yu ^a   Du, Ji Fu ^a   Dai, Hai Yang ^a   Ren, Ding ^a   Huang, Ning Kang ^a  

^a SICHUAN UNIVERSITY   (China)

Author keywords

C SiC films; Surface; XPS

Indexed keywords

ARGON ION BEAM; C-SIC FILMS; HIGH PRESSURE PERMEATION; HYDROGEN ION IRRADIATION; SIC FILMS; SUB-SURFACES; SURFACE LAYERS; XPS;

ARGON; ION BEAMS; ION BOMBARDMENT; OXYGEN; SILICON; SILICON CARBIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

HYDROGEN;

EID: 77955513752     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.03.005     Document Type: Article

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