Comparative study of ohmic contact metallizations to nanocrystalline diamond films

Materials Science Forum

Volumn 645-648, Issue , 2010, Pages 733-735

  Tadjer, Marko J ^a   Anderson, Travis J ^b   Hobart, Karl D ^b   Feygelson, Tatyana I ^c   Butler, James E ^b   Kub, Fritz J ^b  

^a UNIVERSITY OF MARYLAND   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

^c SAIC Inc   (United States)

Author keywords

Annealing; Diamond; Mobility; Nanocrystalline; Ohmic contact; Sheet resistance

Indexed keywords

ANNEALING; CARRIER MOBILITY; DIAMOND FILMS; DIAMONDS; ELECTRIC CONTACTORS; OHMIC CONTACTS; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING FILMS; SHEET RESISTANCE; SILICON CARBIDE;

ATMOSPHERIC CONDITIONS; BORON-DOPED; COMPARATIVE STUDIES; NANOCRYSTALLINE DIAMOND FILMS; NANOCRYSTALLINES; NCD FILMS; P TYPE CONDUCTIVITY;

NANOCRYSTALS;

EID: 77955441022     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.645-648.733     Document Type: Conference Paper

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