The electrical characteristics of Cu/CuS/p-Si/Al structure

Journal of Optoelectronics and Advanced Materials

Volumn 12, Issue 7, 2010, Pages 1466-1471

  Ates A ^a   Saglam M ^a   Guzeldir B ^a   Yildirim, M A ^a,b   Astam, A ^a  

^a ATATÜRK UNIVERSITY   (Turkey)

^b University of Erzincan   (Turkey)

Author keywords

Coatings; Electrical properties; Interfaces; Multilayer; Thin films

Indexed keywords

ALUMINUM COMPOUNDS; BIAS VOLTAGE; COATINGS; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; FILM PREPARATION; INTERFACE STATES; INTERFACES (MATERIALS); MULTILAYER FILMS; MULTILAYERS; SILICON; SILICON COMPOUNDS; THIN FILMS;

CURRENT VOLTAGE CURVE; DENSITY DISTRIBUTIONS; ELECTRICAL CHARACTERISTIC; HIGH CURRENT DENSITIES; MULTI-LAYER DEVICES; RECTIFYING BEHAVIORS; SERIES RESISTANCE EFFECTS; SUCCESSIVE IONIC LAYER ADSORPTION AND REACTIONS;

COPPER COMPOUNDS;

EID: 77955437454     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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