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Applied Surface Science

Volumn 256, Issue 24, 2010, Pages 7442-7445

Structural and morphological study of ZnO thin films electrodeposited on n-type silicon

(8) Ait Ahmed, N a,b Fortas, G b Hammache, H a Sam, S b Keffous, A b Manseri, A b Guerbous, L c Gabouze, N b

a UNIVERSITY OF BEJAIA (Algeria)

b L'Unite de Developpement de la Technologie du Silicium (Algeria)

c CENTRE DE RECHERCHE NUCLÉAIRE D ALGER (Algeria)

Author keywords

Diffraction; Electrodeposition; Morphology; Silicon; Zinc oxide

Indexed keywords

CORROSION; DIFFRACTION; ELECTRODEPOSITION; ELECTRODES; II-VI SEMICONDUCTORS; METALLIC FILMS; MORPHOLOGY; OPTICAL FILMS; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON COMPOUNDS; SUBSTRATES; X RAY DIFFRACTION; ZINC OXIDE;

DEPOSITION TIME; ENERGY DISPERSIVE X-RAY; GLASS SUBSTRATES; HIGH TRANSMISSION; MORPHOLOGICAL STUDY; N TYPE SILICON; TRANSMITTANCE SPECTRA; VISIBLE-WAVELENGTH RANGE;

THIN FILMS;

EID: 77955418140 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2010.05.087 Document Type: Article

Times cited : (11)

References (38)

1
- 33748200635
- J. Zhao, Z.G. Jin, T. Li, and X.X. Liu Appl. Surf. Sci. 252 2006 8287
- (2006) Appl. Surf. Sci. , vol.252 , pp. 8287
- Zhao, J.¹ Jin, Z.G.² Li, T.³ Liu, X.X.⁴

2
- 36449006521
- L. Stolt, J. Hedstrom, J. Kessler, V. Ruckh, K.U. Velthaus, and H.W. Shok Appl. Phys. Lett. 62 1993 597
- (1993) Appl. Phys. Lett. , vol.62 , pp. 597
- Stolt, L.¹ Hedstrom, J.² Kessler, J.³ Ruckh, V.⁴ Velthaus, K.U.⁵ Shok, H.W.⁶

3
- 0036568765
- K. Keis, E. Magnusson, H. Lindstrom, S.-E. Lindquist, and A. Hagfeldt Sol. Energy Mater. Sol. Cells 73 1 2002 51
- (2002) Sol. Energy Mater. Sol. Cells , vol.73 , Issue.1 , pp. 51
- Keis, K.¹ Magnusson, E.² Lindstrom, H.³ Lindquist, S.-E.⁴ Hagfeldt, A.⁵

4
- 0030913555
- R.F. Service Science 276 1997 895 896
- (1997) Science , vol.276 , pp. 895-896
- Service, R.F.¹

5
- 2342507053
- M.H. Zhao, Z.L. Wang, and S.X. Mao Nano Lett. 4 2004 587 590
- (2004) Nano Lett. , vol.4 , pp. 587-590
- Zhao, M.H.¹ Wang, Z.L.² Mao, S.X.³

6
- 0013070473
- H. Jacobs, W. Mokawa, D. Kohl, and G. Heiland Surf. Sci. 160 1985 217
- (1985) Surf. Sci. , vol.160 , pp. 217
- Jacobs, H.¹ Mokawa, W.² Kohl, D.³ Heiland, G.⁴

7
- 0035246835
- P. Nunes, E. Fortunato, and R. Martins Thin Solid Films 383 2001 277
- (2001) Thin Solid Films , vol.383 , pp. 277
- Nunes, P.¹ Fortunato, E.² Martins, R.³

8
- 0000739201
- A. Kuroyanagi Jpn. J. Appl. Phys. 28 1989 219 222
- (1989) Jpn. J. Appl. Phys. , vol.28 , pp. 219-222
- Kuroyanagi, A.¹

9
- 0013118037
- P. Bonasewiez, W. Hirschwald, and G. Neumann Thin Solid Films 142 1986 77 82
- (1986) Thin Solid Films , vol.142 , pp. 77-82
- Bonasewiez, P.¹ Hirschwald, W.² Neumann, G.³

10
- 0034454375
- A.K. Sharma, P.S. Patil, and T.P. Sharma Bull. Electrochem. 16 8 2000 367
- (2000) Bull. Electrochem. , vol.16 , Issue.8 , pp. 367
- Sharma, A.K.¹ Patil, P.S.² Sharma, T.P.³

11
- 0034206938
- T. Pauporte, and D. Lincot Electrochem. Acta 45 2000 3345
- (2000) Electrochem. Acta , vol.45 , pp. 3345
- Pauporte, T.¹ Lincot, D.²

12
- 0036859165
- S. Karuppuchamy, K. Nonomura, T. Yoshida, T. Sugiura, and H. Minoura Solid State Ionics 151 2002 19
- (2002) Solid State Ionics , vol.151 , pp. 19
- Karuppuchamy, S.¹ Nonomura, K.² Yoshida, T.³ Sugiura, T.⁴ Minoura, H.⁵

13
- 0035499588
- S. Karuppuchamy, T. Yoshida, T. Sugiura, and H. Minoura Thin Solid Films 397 2001 63
- (2001) Thin Solid Films , vol.397 , pp. 63
- Karuppuchamy, S.¹ Yoshida, T.² Sugiura, T.³ Minoura, H.⁴

14
- 0842268433
- T. Oekermann, S. Karuppuchamy, T. Yoshida, D. Schlettwein, D. Woehrle, and H. Minoura J. Electrochem. Soc. 151 2004 62
- (2004) J. Electrochem. Soc. , vol.151 , pp. 62
- Oekermann, T.¹ Karuppuchamy, S.² Yoshida, T.³ Schlettwein, D.⁴ Woehrle, D.⁵ Minoura, H.⁶

15
- 17644447679
- T. Yoshida, D. Komatsu, N. Shimokawa, and H. Minoura Thin Solid Films 451 2004 166
- (2004) Thin Solid Films , vol.451 , pp. 166
- Yoshida, T.¹ Komatsu, D.² Shimokawa, N.³ Minoura, H.⁴

16
- 0031162665
- M. Izaki, and T. Omi J. Electrochem. Soc. 144 1997 1949
- (1997) J. Electrochem. Soc. , vol.144 , pp. 1949
- Izaki, M.¹ Omi, T.²

17
- 77955432204
- S. Peulon, and D. Lincot Adv. Mater. 8 1996 127
- (1996) Adv. Mater. , vol.8 , pp. 127
- Peulon, S.¹ Lincot, D.²

18
- 22944467465
- T. Hirate, S. Sasaki, W. Li, H. Miyashita, T. Kimpara, and T. Satoh Thin solid films 487 2005 35
- (2005) Thin Solid Films , vol.487 , pp. 35
- Hirate, T.¹ Sasaki, S.² Li, W.³ Miyashita, H.⁴ Kimpara, T.⁵ Satoh, T.⁶

19
- 31344447822
- B. Mari, F.J. Manjon, M. Mollar, J. Cembrero, and R. Gomez J. Appl. Surf. Sci. 258 2006 2826
- (2006) J. Appl. Surf. Sci. , vol.258 , pp. 2826
- Mari, B.¹ Manjon, F.J.² Mollar, M.³ Cembrero, J.⁴ Gomez, R.⁵

20
- 0037418370
- L. Vayssieres Adv. Mater. 15 2003 464
- (2003) Adv. Mater. , vol.15 , pp. 464
- Vayssieres, L.¹

21
- 33947371285
- F. Wang, R. Liu, A. Pan, L. Cao, K. Cheng, B. Xue, G. Wang, Q. Meng, J. Li, Q. Li, Y. Wang, T. Wang, and B. Zou Mater. Lett. 61 2007 2000
- (2007) Mater. Lett. , vol.61 , pp. 2000
- Wang, F.¹ Liu, R.² Pan, A.³ Cao, L.⁴ Cheng, K.⁵ Xue, B.⁶ Wang, G.⁷ Meng, Q.⁸ Li, J.⁹ Li, Q.¹⁰ Wang, Y.¹¹ Wang, T.¹² Zou, B.¹³

22
- 85031990680
- A. Ghost, Y.G. Gudage, R. Sharma, R.S. Mane, and S.-H. Han J. Transducers 98 2008 1
- (2008) J. Transducers , vol.98 , pp. 1
- Ghost, A.¹ Gudage, Y.G.² Sharma, R.³ Mane, R.S.⁴ Han, S.-H.⁵

23
- 0027593101
- N. Fujimura, T. Nishihara, S. Goto, J. Xu, and T. Ito J. Cryst. Growth 130 1993 269
- (1993) J. Cryst. Growth , vol.130 , pp. 269
- Fujimura, N.¹ Nishihara, T.² Goto, S.³ Xu, J.⁴ Ito, T.⁵

24
- 33947371285
- F. Wang, R. Liu, A. Pan, L. Cao, K. Cheng, B. Xue, G. Weng, Q. Meng, J. Li, Q. Li, Y. Wang, T. Wang, and B. Zou Mater. Lett. 61 2007 2000
- (2007) Mater. Lett. , vol.61 , pp. 2000
- Wang, F.¹ Liu, R.² Pan, A.³ Cao, L.⁴ Cheng, K.⁵ Xue, B.⁶ Weng, G.⁷ Meng, Q.⁸ Li, J.⁹ Li, Q.¹⁰ Wang, Y.¹¹ Wang, T.¹² Zou, B.¹³

25
- 0002081496
- K. Vanheusden, W.L. Warren, C.H. Seager, D.R. Tallant, J.A. Voigt, and B.E. Gnade J. Appl. Phys. 79 1996 7983
- (1996) J. Appl. Phys. , vol.79 , pp. 7983
- Vanheusden, K.¹ Warren, W.L.² Seager, C.H.³ Tallant, D.R.⁴ Voigt, J.A.⁵ Gnade, B.E.⁶

26
- 44649096904
- J.P. Cheng, X.B. Zhang, and Z.Q. Luo Surf. Coat. Technol. 202 2008 4681
- (2008) Surf. Coat. Technol. , vol.202 , pp. 4681
- Cheng, J.P.¹ Zhang, X.B.² Luo, Z.Q.³

27
- 33748871480
- W. Cheng, P. Wu, X. Zou, and T. Xiao J. Appl. Phys. 100 2006 054311
- (2006) J. Appl. Phys. , vol.100 , pp. 054311
- Cheng, W.¹ Wu, P.² Zou, X.³ Xiao, T.⁴

28
- 3042732690
- Z. Fang, Y. Wang, D. Xu, Y. Tan, and X. Liu Opt. Mater. 26 2004 239
- (2004) Opt. Mater. , vol.26 , pp. 239
- Fang, Z.¹ Wang, Y.² Xu, D.³ Tan, Y.⁴ Liu, X.⁵

29
- 33751202980
- X.Q. Wei, B.Y. Man, M. Liu, C.S. Xue, H.Z. Zhung, and C. Yang Physica B 388 2007 145
- (2007) Physica B , vol.388 , pp. 145
- Wei, X.Q.¹ Man, B.Y.² Liu, M.³ Xue, C.S.⁴ Zhung, H.Z.⁵ Yang, C.⁶

30
- 0030120931
- H.J. Egelhaaf, and D. Oelkrug J. Cryst. Growth 161 1996 190
- (1996) J. Cryst. Growth , vol.161 , pp. 190
- Egelhaaf, H.J.¹ Oelkrug, D.²

31
- 0029774658
- K. Vanheusen, C.H. Seager, W.L. Warren, and D.R. Tallant Appl. Phys. Lett. 68 1996 403
- (1996) Appl. Phys. Lett. , vol.68 , pp. 403
- Vanheusen, K.¹ Seager, C.H.² Warren, W.L.³ Tallant, D.R.⁴

32
- 0036438948
- D.H. Zhang, Z.Y. Xue, Q.P. Wang, and J. Ma Proc. SPIE 4918 2002 425
- (2002) Proc. SPIE , vol.4918 , pp. 425
- Zhang, D.H.¹ Xue, Z.Y.² Wang, Q.P.³ Ma, J.⁴

33
- 0035855080
- B. Lin, Z. Fu, and Y. Jia Appl. Phys. Lett. 79 2001 943
- (2001) Appl. Phys. Lett. , vol.79 , pp. 943
- Lin, B.¹ Fu, Z.² Jia, Y.³

34
- 33645952988
- B. Cao, W. Cai, H. Zang, and G. Duan J. Appl. Phys. 99 2006 073516
- (2006) J. Appl. Phys. , vol.99 , pp. 073516
- Cao, B.¹ Cai, W.² Zang, H.³ Duan, G.⁴

35
- 79955985150
- H. Zhou, H. Alves, D.M. Hofmann, W. Kriegseis, B.K. Meyer, G. Kaczmarzyk, and A. Hofmann Appl. Phys. Lett. 80 2002 210
- (2002) Appl. Phys. Lett. , vol.80 , pp. 210
- Zhou, H.¹ Alves, H.² Hofmann, D.M.³ Kriegseis, W.⁴ Meyer, B.K.⁵ Kaczmarzyk, G.⁶ Hofmann, A.⁷

36
- 28144459357
- N.S. Norberg, and D.R. Gamelin J. Phys. Chem. B109 2005 20810
- (2005) J. Phys. Chem. , vol.109 , pp. 20810
- Norberg, N.S.¹ Gamelin, D.R.²

37
- 5644259577
- N. Serpone, D. Lawless, and R. Khairutdinov J. Phys. Chem. 99 1995 16646
- (1995) J. Phys. Chem. , vol.99 , pp. 16646
- Serpone, N.¹ Lawless, D.² Khairutdinov, R.³

38
- 0033534972
- I.K. El Zawawi, and R.A. Abd Alla Thin Solid Films 339 1999 314
- (1999) Thin Solid Films , vol.339 , pp. 314
- El Zawawi, I.K.¹ Abd Alla, R.A.²

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