Mechanisms and processing limits in laser thermochemical machining

CIRP Annals - Manufacturing Technology

Volumn 59, Issue 1, 2010, Pages 251-254

  Stephen, A ^a   Vollertsen, F ^a  

^a BIAS BREMER INSTITUT FÜR ANGEWANDTE STRAHLTECHNIK GMBH   (Germany)

Author keywords

Etching; Laser; Mechanism

Indexed keywords

BASIC MECHANISM; DIFFUSION COEFFICIENTS; HIGH QUALITY; IRRADIATED AREA; LASER WAVELENGTH; LIMITING FACTORS; MACHINING QUALITY; MICRO PART;

ASPECT RATIO; LIQUIDS; MACHINING;

ETCHING;

EID: 77955337676     PISSN: 00078506     EISSN: 17260604     Source Type: Journal    
DOI: 10.1016/j.cirp.2010.03.069     Document Type: Article

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