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Physics Letters, Section A: General, Atomic and Solid State Physics

Volumn 374, Issue 31-32, 2010, Pages 3254-3257

Enhanced deuterium diffusion in boron doped monocrystalline diamond films using bias-assisted MPCVD

(7) Arnault, J C a Saada, S a Mer Calfati, C a Jomard, F b Habka, N b Barjon, J b Chevallier, J b

a DIF (France)

b LABORATOIRE DES SCIENCES DU CLIMAT ET DE L ENVIRONNEMENT (France)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; DEUTERIUM; DIAMOND FILMS; DIFFUSION; ETCHING;

BORON-DOPED; BORON-DOPED DIAMOND FILMS; DIAMOND SURFACES; EFFECTIVE DIFFUSION COEFFICIENTS; MICROWAVE PLASMA; MONOCRYSTALLINE DIAMOND FILMS; SIMS PROFILE;

BIAS VOLTAGE;

EID: 77955320550 PISSN: 03759601 EISSN: None Source Type: Journal
DOI: 10.1016/j.physleta.2010.06.009 Document Type: Article

Times cited : (10)

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