|
Volumn 405, Issue 16, 2010, Pages 3412-3420
|
Structure, optical and electrochromic properties of NiO thin films
|
Author keywords
Electrochromic materials; Nickel oxide; Solgel; Thin films
|
Indexed keywords
ABSORPTION COEFFICIENTS;
ANNEALING TEMPERATURES;
ELECTROCHROMIC BEHAVIOR;
ELECTROCHROMIC MATERIALS;
ELECTROCHROMIC PERFORMANCE;
ELECTROCHROMIC PROPERTIES;
ETHYL ALCOHOLS;
EXTINCTION COEFFICIENT (K);
INDIUM TIN OXIDE GLASS;
NICKEL ACETATE TETRAHYDRATE;
NICKEL OXIDE THIN FILMS;
NIO THIN FILM;
POLYCRYSTALLINE STRUCTURE;
SCHERRER FORMULA;
SOL GEL DIP COATING;
SOL-GEL THIN FILMS;
STARTING MATERIALS;
TRANSMISSION ELECTRON MICROSCOPE;
XRD;
COATINGS;
ELECTROCHROMIC DEVICES;
ELECTROCHROMISM;
ETHANOL;
FILM PREPARATION;
ITO GLASS;
NICKEL;
NICKEL ALLOYS;
NICKEL COATINGS;
NICKEL OXIDE;
OPTICAL CONSTANTS;
ORGANIC POLYMERS;
ORGANOMETALLICS;
OXIDE FILMS;
PARTICLE SIZE ANALYSIS;
REFRACTIVE INDEX;
THERMOGRAVIMETRIC ANALYSIS;
THIN FILMS;
TIN;
TITANIUM COMPOUNDS;
TRANSMISSION ELECTRON MICROSCOPY;
VAPOR DEPOSITION;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
OPTICAL FILMS;
|
EID: 77955305899
PISSN: 09214526
EISSN: None
Source Type: Journal
DOI: 10.1016/j.physb.2010.05.015 Document Type: Article |
Times cited : (115)
|
References (29)
|