Controlled positioning of large interfacial nanocavities via stress-engineered void localization

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Volumn 6, Issue 15, 2010, Pages 1603-1607

  Güder, Firat ^a   Yang, Yang ^a,b   Goetze, Silvana ^b   Berger, Andreas ^b   Ramgir, Niranjan ^a   Hesse, Dietrich ^b   Zacharias, Margit ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

Interfacial reaction; Nanocavities; Solid state reaction; Stress gradient; Void localization

Indexed keywords

CORE-SHELL NANOWIRES; INTERFACIAL REACTIONS; KIRKENDALL EFFECTS; KIRKENDALL VOID; MULTILAYER STRUCTURES; NANO SCALE; NANO-CAVITIES; SOLID-SOLID REACTION; STRESS GRADIENT; VOID NUCLEATION;

SOLID STATE REACTIONS;

NANOWIRE; ZINC OXIDE;

ARTICLE; CHEMISTRY; METHODOLOGY; NANOTECHNOLOGY; TRANSMISSION ELECTRON MICROSCOPY; ULTRASTRUCTURE;

MICROSCOPY, ELECTRON, TRANSMISSION; NANOTECHNOLOGY; NANOWIRES; ZINC OXIDE;

EID: 77955215242     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.201000561     Document Type: Article

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