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Volumn 1, Issue 5, 2010, Pages 731-738

Gas plasma sterilization of microorganisms and mechanisms of action

Author keywords

Etching; Gas plasma sterilization; Oxygen gas; Rare gases; Vacuum UV

Indexed keywords

ARGON; HELIUM; ION; NEON; NITROGEN; OXYGEN; RADICAL; XENON;

EID: 77955209396     PISSN: 17920981     EISSN: 17921015     Source Type: Journal    
DOI: 10.3892/etm.2010.136     Document Type: Review
Times cited : (142)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.