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Applied Physics Letters

Volumn 97, Issue 2, 2010, Pages

Molecular χ (2) gratings via electron-beam lithography

(4) Domínguez Juárez, Jorge Luis a MacOvez, Roberto a González, María Ujue b Martorell, Jordi a,c

a ICFO INSTITUT DE CIENCIES FOTONIQUES (Spain)

b INSTITUTO DE MICROELECTRÓNICA DE MADRID (Spain)

c UNIVERSITAT POLITÈCNICA DE CATALUNYA (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION ORDERS; ELECTRON BEAM PATTERNING; LINEAR DIFFRACTION; MOLECULAR FILMS; NON-LINEAR OPTICAL ACTIVITY; NONLINEAR DIPOLES; ORGANIC MOLECULES; PERIODIC MODULATION; RELATIVE INTENSITY; SCANNING ELECTRON MICROSCOPE; SECOND HARMONICS;

ELECTRON BEAMS; ELECTRON IRRADIATION; SCANNING ELECTRON MICROSCOPY;

ELECTRONS;

EID: 77955157604 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3464161 Document Type: Article

Times cited : (2)

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