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Volumn 46, Issue 9, 2010, Pages 1295-1300
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Simulation-based study of MEMS X-ray optics for microanalysis
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Author keywords
Micro analysis; microelectromechanical systems (MEMS); X ray
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Indexed keywords
FINE FOCUS;
INTENSITY GAIN;
MICROELECTROMECHANICAL SYSTEMS;
MICROELECTROMECHANICAL-SYSTEMS TECHNOLOGIES;
MICROPORES;
RAY TRACING SIMULATION;
SIDE WALLS;
SIMULATION-BASED;
X RAY MIRRORS;
MECHATRONICS;
MEMS;
MICROANALYSIS;
MICROELECTROMECHANICAL DEVICES;
OPTICAL SYSTEMS;
PLASMA ETCHING;
X RAY OPTICS;
X RAYS;
COMPOSITE MICROMECHANICS;
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EID: 77955152165
PISSN: 00189197
EISSN: None
Source Type: Journal
DOI: 10.1109/JQE.2010.2047380 Document Type: Article |
Times cited : (8)
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References (6)
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