SCOPUS 정보 검색 플랫폼

Volumn 35, Issue 14, 2010, Pages 2490-2492

Investigations of femtosecond-nanosecond dual-beam laser ablation of dielectrics

(8) Lin, Cheng Hsiang a,b Rao, Zheng Hua b Jiang, Lan c Tsai, Wu Jung d Wu, Ping Han d Chien, Chih Wei d Chen, Shean Jen a Tsai, Hai Lung b

a NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

b University of Missouri Rolla (United States)

c BEIJING INSTITUTE OF TECHNOLOGY (China)

d INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION DEPTH; DUAL-BEAM; EXPERIMENTAL INVESTIGATIONS; FEMTOSECONDS; FREE-ELECTRON DENSITY; FS LASER; FS PULSE; LASER ENERGIES; LASER SYSTEMS; MATERIAL REMOVAL; PULSE ENVELOPES;

COMPOSITE MICROMECHANICS; ELECTRONS; LASER ABLATION; MICROMACHINING; OPTICAL PROPERTIES; PULSED LASER APPLICATIONS; SILICA;

FUSED SILICA;

EID: 77955004240 PISSN: 01469592 EISSN: 15394794 Source Type: Journal
DOI: 10.1364/OL.35.002490 Document Type: Article

Times cited : (36)

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