Modeling solvation on the chemically modified silica surfaces

Journal of Separation Science

Volumn 33, Issue 14, 2010, Pages 2060-2068

  Buszewski, Bogusław ^a   Bocian, Szymon ^a   Nowaczyk, Alicja ^b  

^a NICOLAUS COPERNICUS UNIVERSITY   (Poland)

^b NICOLAUS COPERNICUS UNIVERSITY   (Poland)

Author keywords

Alkyl bonded phase; Coverage density; Excess adsorption; Hydrophobic effect; Solvent adsorption modeling

Indexed keywords

ACETONITRILE; ADSORPTION; ALKYLATION; COMPUTER SIMULATION; HYDROCARBONS; HYDROPHOBICITY; LIGANDS; SILICA;

ANALYTICAL CHEMISTS; CHEMICALLY MODIFIED SILICAS; EXCESS ADSORPTION; EXPERIMENTAL MEASUREMENTS; HYDROPHOBIC EFFECT; MOBILE PHASE; MOLECULAR LEVELS; OCTADECYL; ORGANIC LIGANDS; PREFERENTIAL ADSORPTION; RETENTION MECHANISM; RP-HPLC; SILICA SURFACE; SOLVENT ADSORPTION; WATER MOLECULE;

ORGANIC SOLVENTS;

ACETONITRILE; SILICON DIOXIDE; ACETONITRILE DERIVATIVE; GEL; SOLVENT;

ADSORPTION KINETICS; ARTICLE; CHEMICAL BOND; COMPUTER SIMULATION; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; ISOTHERM; PRIORITY JOURNAL; SIMULATION; SOLVATION; ADSORPTION; CHEMICAL MODEL; CHEMICAL STRUCTURE; CHEMISTRY; GEL; PROCEDURES; SURFACE PROPERTY;

ACETONITRILES; ADSORPTION; CHROMATOGRAPHY, HIGH PRESSURE LIQUID; COMPUTER SIMULATION; GELS; MODELS, CHEMICAL; MODELS, MOLECULAR; SILICON DIOXIDE; SOLVENTS; SURFACE PROPERTIES;

EID: 77954962242     PISSN: 16159306     EISSN: 16159314     Source Type: Journal    
DOI: 10.1002/jssc.201000101     Document Type: Article

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