Configuration of plasma processes for the generation of a chemical triple pattern for cell-based RNA arrays

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Schröder, Karsten ^a   Busse, Benedikt ^b   Steffen, Hartmut ^a   Ohl, Andreas ^a   Quade, Antje ^a   Weltmann, Klaus Dieter ^a  

^a LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

^b Zeil Kontakt GmbH   (Germany)

Author keywords

Ammonia discharges; Cell patterning; ESCA XPS; Fluoropolymers; Microwave discharges

Indexed keywords

CELL-PATTERNING; ESCA/XPS; FLUORO-POLYMERS; MICROWAVE DISCHARGE; MICROWAVE DISCHARGES;

AMMONIA; FUNCTIONAL POLYMERS; OPTICAL PROPERTIES; PHOTORESISTS; POLYMERS; RNA; THERMOANALYSIS;

ELECTRIC DISCHARGES;

EID: 77954948407     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200930303     Document Type: Conference Paper

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