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Optics Letters

Volumn 35, Issue 8, 2010, Pages 1290-1292

Highly efficient nonuniform grating coupler for silicon-on-insulator nanophotonic circuits

(5) Tang, Yongbo a,b Wang, Zhechao a,b Wosinski, Lech a,b Westergren, Urban a,b He, Sailing a,b

a Zhejiang University (China)

b ROYAL INSTITUTE OF TECHNOLOGY (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING PROCESS; FIBER MODE; FIBER-COUPLING EFFICIENCY; GRATING COUPLERS; HIGH EFFICIENCY; LAG EFFECTS; NANOPHOTONIC CIRCUITS; NANOPHOTONIC WAVEGUIDES; NONUNIFORM; SILICON ON INSULATOR; SILICON ON INSULATOR WAFERS; TRANSVERSE ELECTRIC POLARIZATIONS;

NANOPHOTONICS; PLASMA ETCHING; SILICON WAFERS; SINGLE MODE FIBERS; WAVEGUIDES;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77954911525 PISSN: 01469592 EISSN: 15394794 Source Type: Journal
DOI: 10.1364/OL.35.001290 Document Type: Article

Times cited : (146)

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