Different underlying corrosion mechanism for Mg bulk alloys and Mg thin films

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Blawert, Carsten ^a   Heitmann, Volker ^a   Scharnagl, Nico ^a   Störmer, Michael ^a   Lutz, Johanna ^b,c   Prager Duschke, Andrea ^b   Manova, Darina ^b   Mändl, Stephan ^b  

^a INSTITUTE OF MATERIALS RESEARCH   (Germany)

^b LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

^c UNIVERSITY OF LEIPZIG   (Germany)

Author keywords

Corrosion; Magnesium; Physical vapour deposition

Indexed keywords

AQUEOUS NACL SOLUTIONS; BULK ALLOYS; CAST ALLOYS; CORROSION MECHANISMS; IMMERSION TESTS; INDUCTIVELY COUPLED PLASMA SPECTROSCOPY; MG THIN FILMS; NOMINAL COMPOSITION; PHYSICAL VAPOUR DEPOSITION; PITTING CORROSION; POLARISATION; POTENTIODYNAMICS; THIN FILM ALLOYS; UNIFORM CORROSION;

ALLOYS; CORROSION RESISTANCE; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROMAGNETIC INDUCTION; INDUCTIVELY COUPLED PLASMA; MAGNESIUM; MAGNESIUM ALLOYS; MICROSTRUCTURE; PITTING; SODIUM CHLORIDE; THIN FILMS;

CORROSION RATE;

EID: 77954907694     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200932405     Document Type: Conference Paper

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