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Volumn 81, Issue 2, 2010, Pages

Competing magnetic interactions in exchange-bias-modulated films

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EID: 77954798971     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.81.024420     Document Type: Article
Times cited : (19)

References (27)
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    • W. H. Meiklejohn and C. P. Bean, Phys. Rev. 102, 1413 (1956). 10.1103/PhysRev.102.1413
    • (1956) Phys. Rev. , vol.102 , pp. 1413
    • Meiklejohn, W.H.1    Bean, C.P.2
  • 17
    • 53149112904 scopus 로고    scopus 로고
    • in Matter and Materials Series Vol. edited by T. Brückel and Schriften des Forschungszentrum, Juelich, W. Schweika
    • B. P. Toperverg, in Polarized Neutron Scattering, Matter and Materials Series Vol. 12, edited by, T. Brückel, and, W. Schweika, (Schriften des Forschungszentrum, Juelich, 2002), p. 274.
    • (2002) Polarized Neutron Scattering , vol.12 , pp. 274
    • Toperverg, B.P.1
  • 18
    • 77954792392 scopus 로고    scopus 로고
    • -+ = 0.
    • -+ = 0.
  • 19
    • 26144449160 scopus 로고
    • 10.1103/PhysRev.95.359
    • L. Parratt, Phys. Rev. 95, 359 (1954). 10.1103/PhysRev.95.359
    • (1954) Phys. Rev. , vol.95 , pp. 359
    • Parratt, L.1
  • 22
    • 77954771700 scopus 로고    scopus 로고
    • A few points close to the origin deviate from the model curve due to contamination by the direct beam at very low angles of incidence. Those few points were excluded from the fit
    • A few points close to the origin deviate from the model curve due to contamination by the direct beam at very low angles of incidence. Those few points were excluded from the fit.
  • 25
    • 77954793717 scopus 로고    scopus 로고
    • For the simulation the exact stripe width of the oxidized stripes was determined to be 1.45 μm. The deviation to Dst /2=2 μm results from a systematic offset of about 0.5 μm due to the lithography process
    • For the simulation the exact stripe width of the oxidized stripes was determined to be 1.45μm. The deviation to D st / 2 = 2 μm results from a systematic offset of about 0.5 μm due to the lithography process.
  • 26
    • 77954791616 scopus 로고    scopus 로고
    • -. This is caused by an exchange-biased magnetic frame around the sample still magnetized opposite to the magnetic field direction. This frame was present for the neutron measurements but was removed for the inductive magnetization-loop measurements. For the fit of the specular intensities, the surrounding frame was included in the fitting model.
    • -. This is caused by an exchange-biased magnetic frame around the sample still magnetized opposite to the magnetic field direction. This frame was present for the neutron measurements but was removed for the inductive magnetization-loop measurements. For the fit of the specular intensities, the surrounding frame was included in the fitting model.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.