SCOPUS 정보 검색 플랫폼

Surface and Interface Analysis

Volumn 42, Issue 6-7, 2010, Pages 1168-1171

Reduction of thin oxide films on tungsten substrate with highly reactive cold hydrogen plasma

(5) Vesel, Alenka a Drenik, Aleksander a Zaplotnik, Rok a Mozetic, Miran a Balat Pichelin, Marianne b

a JO EF STEFAN INSTITUTE (Slovenia)

b Centre National de la Recherche Scientifique (France)

Author keywords

AES; Hydrogen plasma; Oxide reduction; Surface treatment; Tungsten oxide; XPS

Indexed keywords

HYDROGEN PLASMA; HYDROGEN PLASMAS; OXIDE REDUCTION; TUNGSTEN OXIDE; XPS;

ATOMS; ELECTRIC DISCHARGES; HYDROGEN; OXIDES; OXYGEN; PLASMA APPLICATIONS; PLASMA DENSITY; PLASMAS; SURFACE TREATMENT; TUNGSTEN; TUNGSTEN COMPOUNDS; VOLTAGE DIVIDERS; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDE FILMS;

EID: 77954282853 PISSN: 01422421 EISSN: 10969918 Source Type: Journal
DOI: 10.1002/sia.3185 Document Type: Conference Paper

Times cited : (18)

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