Structure and composition of trivalent chromium process (TCP) films on Al alloy

Langmuir

Volumn 26, Issue 13, 2010, Pages 10833-10841

  Dong, Xuecheng ^a   Wang, Peng ^a   Argekar, Sandip ^a   Schaefer, Dale W ^a  

^a UNIVERSITY OF CINCINNATI   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AL ALLOYS; DEPOSITION METHODS; DEPOSITION TIME; DRIED FILMS; FILM COMPOSITION; LINEAR GROWTH; NEUTRON REFLECTIVITY; PRECURSOR SOLUTIONS; TRIVALENT CHROMIUM; UNIFORM STRUCTURE; X RAY REFLECTIVITY;

ALUMINUM ALLOYS; CHEMICAL VAPOR DEPOSITION; CHROMIUM; FILM GROWTH; REFLECTION;

CERIUM ALLOYS;

EID: 77954255990     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la100699u     Document Type: Article

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