Photoelectrochemical study of nickel base alloys oxide films formed at high temperature and high pressure water

Electrochimica Acta

Volumn 55, Issue 19, 2010, Pages 5384-5392

  Marchetti, L ^a   Perrin, S ^a   Wouters, Y ^b   Martin, F ^a   Pijolat, M ^c  

^a DIF   (France)

^b UNIV GRENOBLE ALPES   (France)

^c CENTRE SPIN   (France)

Author keywords

Nickel base alloys; Oxide film; Photoelectrochemistry; PWR primary medium; Semiconducting properties

Indexed keywords

BAND GAPS; COOLANT CONDITIONS; HIGH TEMPERATURE AND HIGH PRESSURE; MACROSCOPIC ENERGY; MICRON SCALE; MONOCHROMATIC LIGHT; NICKEL BASE ALLOYS; NICKEL FERRITE; NICKEL HYDROXIDES; OXIDE SCALE; PHOTO-ELECTROCHEMISTRY; PHOTOCURRENT GENERATIONS; PHOTOELECTROCHEMICAL TECHNIQUE; PHOTOELECTROCHEMICALS; PRESSURISED WATER REACTOR; RE-CIRCULATION LOOPS; SEMI-CONDUCTING PROPERTY; SEMI-CONDUCTION; SEMICONDUCTOR PHASIS; SPINEL PHASE;

ALLOYS; CHROMIUM; ELECTROCHEMISTRY; ENERGY GAP; FERRITE; MONOCHROMATORS; NICKEL; NICKEL ALLOYS; NICKEL OXIDE; PRESSURIZED WATER REACTORS; ROCK DRILLS; SCALE (DEPOSITS); SPECTROSCOPY;

OXIDE FILMS;

EID: 77954244476     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2010.04.063     Document Type: Article

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