Niobium-based catalysts prepared by reactive radio-frequency magnetron sputtering and arc plasma methods as non-noble metal cathode catalysts for polymer electrolyte fuel cells

Electrochimica Acta

Volumn 55, Issue 19, 2010, Pages 5393-5400

  Ohnishi, Ryohji ^a   Katayama, Masao ^a   Takanabe, Kazuhiro ^a   Kubota, Jun ^a   Domen, Kazunari ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Arc plasma; Niobium; Non noble metal cathode; Oxygen reduction reaction; PEFC

Indexed keywords

ARC PLASMA; ARC PLASMA DEPOSITION; ATOMIC LEVELS; CATHODE CATALYST; ELECTROCHEMICAL MEASUREMENTS; HIGHLY ORIENTED PYROLYTIC GRAPHITE; NANOSCALE SURFACE MORPHOLOGY; NITROGEN SPECIES; NOBLE METALS; ONSET POTENTIAL; OXYGEN REDUCTION; OXYGEN REDUCTION REACTION; POLYMER ELECTRODES; POLYMER ELECTROLYTE FUEL CELLS; RADIO FREQUENCY MAGNETRON SPUTTERING; REACTIVE RADIO-FREQUENCY MAGNETRON SPUTTERING; REVERSIBLE HYDROGEN ELECTRODES; RF-MAGNETRON SPUTTERING; SCANNING TUNNELING MICROSCOPY (STM); TRANSMISSION ELECTRON MICROSCOPY OBSERVATION; VACUUM METHOD;

CARBON BLACK; CARBON FILMS; CATALYSTS; ELECTROLYTIC REDUCTION; FUEL CELLS; GLASSY CARBON; MAGNETRON SPUTTERING; METALS; NIOBIUM; NITROGEN; OXYGEN; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; PRECIOUS METALS; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

FILM PREPARATION;

EID: 77954242472     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2010.04.090     Document Type: Article

References (35)

1. H.A. Gasteiger, S.S. Kocha, B. Sompalli, and F.T. Wagner Appl. Catal. B 56 2005 9
2. R. Borup, J. Meyers, B. Pivovar, Y.S. Kim, R. Mukundan, N. Garland, D. Myers, M. Wilson, F. Garzon, D. Wood, P. Zelenay, K. More, K. Stroh, T. Zawodzinski, J. Boncella, J.E. McGrath, M. Inaba, K. Miyatake, M. Hori, K. Ota, Z. Ogumi, S. Miyata, A. Nishikata, Z. Siroma, Y. Uchimoto, K. Yasuda, K. Kimijima, and N. Iwashita Chem. Rev. 107 2007 3904
3. P. Yu, M. Pemberton, and P. Plasse J. Power Source 144 2005 11
4. P.J. Ferreira, G.J. La O', Y. Shao-Horn, D. Morgan, R. Makharia, S. Kocha, and H.A. Gasteiger J. Electrochem. Soc. 152 2005 A2256
5. R. Jasinski Nature 201 1964 1212
6. S. Gupta, D. Tryk, I. Bae, W. Aldred, and E. Yeager J. Appl. Electrochem. 19 1989 19
7. M.C. Martins Alives, J.P. Dodelet, D. Guay, M. Ladouceur, and G. Tourillon J. Phys. Chem. 96 1992 10898
8. M. Lefvre, and J.P. Dodelet Electrochim. Acta 48 2003 2749
9. P. Bogdanoff, I. Herrmann, M. Hilgendorff, I. Dorbandt, S. Fiechter, and H. Tributsch J. New Mater. Electrochem. Systems 7 2004 85
10. C. Médard, M. Lefvre, J.P. Dodelet, F. Jaouen, and G. Lindbergh Electrochim. Acta 51 2006 3202
11. U.I. Koslowski, I. Abs-Wurmbach, S. Fiechter, and P. Bogdanoff J. Phys. Chem. C 112 2008 15356
12. R. Bashyam, and P. Zelenay Nature 443 2006 63
13. J. Maruyama, and I. Abe Chem. Commun. 27 2007 2879
14. J. Maruyama, J. Okamura, K. Miyazaki, and I. Abe J. Phys. Chem. C 111 2007 6597
15. A. Garsuch, R. d'Eon, T. Dahn, O. Klepel, R.R. Garsuch, and J.R. Dahna J. Electrochem. Soc. 155 2008 B236
16. M. Lefvre, E. Proietti, F. Jaouen, and J.P. Dodelet Science 324 2009 71
17. F. Jaouen, J. Herranz, M. Lefvre, J.P. Dodelet, U.I. Kramm, I. Herrmann, P. Bogdanoff, J. Maruyama, T. Nagaoka, A. Garsuch, J.R. Dahn, T. Olson, S. Pylypenko, P. Atanassov, and E.A. Ustinov ACS Appl. Mater. Interfaces 8 2009 1623
18. L. Zhang, J.J. Zhang, D.P. Wilkinson, and H.J. Wang J. Power Sources 156 2006 171
19. Y. Liu, A. Ishihara, S. Mitsushima, N. Kamiya, and K. Ota Electrochem. Solid-State Lett 8 2005 A400
20. J.-H. Kim, A. Ishihara, S. Mitsushima, N. Kamiya, and K. Ota Electrochim. Acta 52 2007 2492
21. A. Ishihara, S. Doi, S. Mitsushima, and K. Ota Electrochim. Acta 53 2005 5442
22. G. Liu, H.M. Zhang, M.R. Wang, H.X. Zhong, and J. Chen J. Power Sources 172 2007 503
23. S. Doi, A. Ishihara, S. Mitsushima, N. Kamiya, and K. Ota J. Electrochem. Soc. 154 2007 B362
24. A. Takagaki, Y. Takahashi, F. Yin, K. Takanabe, J. Kubota, and K. Domen J. Electrochem. Soc. 156 2009 B811
25. R. Ohnishi, Y. Takahashi, A. Takagaki, J. Kubota, and K. Domen Chem. Lett. 37 2008 838
26. Proceedings of the IEEE, International Conference, Ion Implantation Technology Kyoto 1998 1148
27. Y. Zhao, H. Nakano, H. Murakami, T. Sugai, H. Shinohara, and Y. Saito Appl. Phys. 85 2006 103
28. J. Fayos J. Solid State Chem. 148 1999 278
29. F. Lenzmann, V. Shklover, K. Brooks, and M. Grätzel J. Sol-Gel Sci. Technol. 19 2000 175
30. V.M. Weishaupt, and J. Strähle Z. Anorg. Allg. Chem. 429 1977 261
31. M.A.B. Gomes, L.O. de, S. Bulhoes, S.C. de Castro, and A.J. Damiao J. Electrochem. Soc. 137 1990 3067
32. A. Darlinski, and J. Halbritter Surf. Interface Anal. 10 1987 223
33. E. Raymundo-Piñero, D. Cazorla-Amorós, A. Linares-Solano, J. Find, U. Wild, and R. Schlögl Carbon 40 2002 597
34. S.I. Park, and C.F. Quate Appl. Phys. Lett. 48 1986 112
35. H. Niwa, K. Horiba, Y. Harada, M. Oshima, T. Ikeda, K. Terakura, J. Ozaki, and S. Miyata J. Power. Sources 187 2009 94