Gas-liquid interfacial plasmas: Basic properties and applications to nanomaterial synthesis

Plasma Physics and Controlled Fusion

Volumn 51, Issue 12, 2009, Pages

  Kaneko, T ^a,b   Baba, K ^a   Hatakeyama, R ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BASIC PROPERTIES; CATHODE ELECTRODES; EFFICIENT SYNTHESIS; GAS LIQUIDS; GAS PRESSURES; HIGH DENSITY; HIGH HEAT CAPACITY; ION IRRADIATION; IONIZED PLASMAS; LOW VAPOR PRESSURES; METAL CHLORIDES; METAL NANOPARTICLES; MONO-DISPERSED; NANOMATERIAL; PLASMA IRRADIATIONS; SECONDARY ELECTRON EMISSIONS; SHEATH ELECTRIC FIELD;

CARBON NANOTUBES; CHLORINE COMPOUNDS; ELECTRIC FIELDS; GRAFTING (CHEMICAL); IONIZATION OF GASES; IONIZATION OF LIQUIDS; IONS; IRRADIATION; METALS; NANOPARTICLES; PLASMAS; SECONDARY EMISSION; SYNTHESIS (CHEMICAL); VAPOR PRESSURE;

IONIC LIQUIDS;

EID: 70449704387     PISSN: 07413335     EISSN: 13616587     Source Type: Journal    
DOI: 10.1088/0741-3335/51/12/124011     Document Type: Article

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