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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 4, 2010, Pages 766-773

Coating growth behavior during the plasma electrolytic oxidation process

(3) Hussein, R O a Northwood, D O a Nie, X a

a UNIVERSITY OF WINDSOR (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AL ALLOYS; ALUMINUM OXIDES; APPLIED VOLTAGES; COATING GROWTH; CURRENT MODE; DC PLASMA; DC POWER; FREQUENCY RANGES; HARD CERAMIC COATINGS; HIGH TEMPERATURE; HOMOGENOUS COATINGS; INTERFACE LAYER; MELT POOL; PEAK TEMPERATURES; PLASMA ELECTROLYTIC OXIDATION; PLASMA ELECTRONS; PLASMA TEMPERATURE; PULSED DC; SINTERING TIME;

ALUMINUM COATINGS; ATMOSPHERIC PRESSURE; CERAMIC COATINGS; DC POWER TRANSMISSION; ELECTROLYSIS; ELECTRON TEMPERATURE; EMISSION SPECTROSCOPY; HARD COATINGS; LASER PRODUCED PLASMAS; MORPHOLOGY; OPTICAL EMISSION SPECTROSCOPY; OXIDATION; PHASE INTERFACES; PROTECTIVE COATINGS; SCANNING ELECTRON MICROSCOPY; SINTERING;

ELECTRIC DISCHARGES;

EID: 77954196318 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3429583 Document Type: Conference Paper

Times cited : (104)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.