Elastic wave velocities of silica glass at high temperatures and high pressures

Journal of Applied Physics

Volumn 107, Issue 12, 2010, Pages

  Yokoyama, Ayako ^a   Matsui, Masanori ^a   Higo, Yuji ^b   Kono, Yoshio ^c   Irifune, Tetsuo ^c   Funakoshi, Ken Ichi ^b  

^a UNIVERSITY OF HYOGO   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^c EHIME UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT PRESSURES; AMORPHOUS TRANSFORMATION; COMPRESSION REGIONS; COMPRESSIONAL; ELASTIC WAVE VELOCITY; FIRST-ORDER; FUNCTION OF PRESSURE; HIGH PRESSURE; HIGH TEMPERATURE; IN-SITU SYNCHROTRONS; ISOTHERMAL RUNS; MINIMUM VALUE; MOLECULAR DYNAMICS SIMULATIONS; MULTI-ANVIL APPARATUS; NEGATIVE THERMAL EXPANSION; P- AND S-WAVES; PISTON CYLINDERS; PRESSURE AND TEMPERATURE; PRESSURE RANGES; RADIOGRAPHIC TECHNIQUE; SILICA GLASS; ULTRASONIC INTERFEROMETRY; WAVE VELOCITY;

FUSED SILICA; GLASS; MOLECULAR DYNAMICS; OXIDES; SHEAR WAVES; SILICA; THERMAL EXPANSION; ULTRASONIC TESTING; X RAY DIFFRACTION; X RAY RADIOGRAPHY;

VELOCITY;

EID: 77954186612     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3452382     Document Type: Article

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