Transformations in the intermediate-range structure of SiO2 glass under high pressure and temperature

Physical Review Letters

Volumn 93, Issue 1, 2004, Pages

  Inamura, Yasuhiro ^a   Katayama, Yoshinori ^a   Utsumi, Wataru ^a   Funakoshi, Ken Ichi ^b  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLIZATION; DENSITY (SPECIFIC GRAVITY); HIGH PRESSURE EFFECTS; HIGH TEMPERATURE EFFECTS; MIXTURES; PHASE TRANSITIONS; RELAXATION PROCESSES; THERMOCOUPLES; X RAY DIFFRACTION ANALYSIS;

MOMENTUM TRANSFER; TEMPERATURE-INDUCED SHIFTS; THERMAL RELAXATIONS; X-RAY STRUCTURE FACTOR;

FUSED SILICA;

EID: 3543049526     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.93.015501     Document Type: Article

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